Used HITACHI / KOKUSAI DD-802V-H #9250086 for sale

HITACHI / KOKUSAI DD-802V-H diffusion furnace is a high-temperature thermal processing equipment composed of a stand-alone furnace, vacuum pump, and related accessories. The furnace operates under a steady-state atmosphere at temperatures up to 1200C and is equipped with a reactant delivery system for supplying controlled amounts of gaseous and/or liquid species to the reactor chamber. The reactor chamber volume is 2.05 cubic feet (58 liters) with a heat-up zone of 1.24 cubic feet (35 liters). The unit also includes a quartz septum tube situated in the reactor chamber for transferring of samples. The diffusion furnace is designed for thermal processing of electronic components with highest repeatability. It features two independent temperature-control areas, each independently programmable up to 1200C for thermal processing of wafers, pieces and components. The temperature is regulated via a temperature controller and digital display of the required cooling rate, heating rate and gradient. The gradient of temperature can be monitored by a built-in pyrometer which functions as an accurate and closed-loop temperature-control machine for uniformity of temperatures throughout the chamber. The control range is adjustable from ambient + 20C to 1200C. The furnace is also equipped with an automated cooling module to quickly cool down the chamber to the set temperature range in under 10 minutes. HITACHI DD-802V-H diffusion furnace is also designed for high throughput processing using high temperature operation with a fast ramp rate of up to 150C per minute. The furnace is covered with a steel housing designed for easy maintenance and efficient operational use. The reactor walls are designed for optimal heat and mass transfer efficiency and maximum operational life. The heating elements are provided as crucible elements for maximum temperature uniformity, while the cooling-down rate, temperature gradient and balance constants are adjustable to suit a wide range of materials. The furnace is also equipped with an extra furnace outlet to release the purge gas, allowing for a more efficient operation. Finally, extensive safety features have been integrated into the gas valves to ensure safe operation at all times. All these features and capabilities make KOKUSAI DD-802V-H diffusion furnace a reliable, cost-efficient and highly efficient thermal processing tool. It is capable of producing quality electronic devices with minimal thermal process variations and meet the challenging production needs of modern industry. It is an excellent choice for cost and energy savings in the industry.