Used HITACHI / KOKUSAI DD-802V #9269474 for sale

HITACHI / KOKUSAI DD-802V is a diffusion furnace and accessories designed for the manufacture of semiconductor devices. It is used in a variety of industries, including consumer electronics, aerospace, and the automotive industry. The furnace is composed of several components, including a chamber, a power supply, a gas delivery equipment, and a cooling system. The muffle chamber in HITACHI DD-802V is made from an Alumina or quartz plate for uniform heat distribution. The chamber is equipped with several temperature sensors to monitor and control the temperature distribution. The temperature range available on KOKUSAI DD-802V is 200-900°C with an accuracy of ±5°C. The chamber also comes with an in-situ gas delivery unit, which helps in maintaining a uniform flow of process gases such as CVD, PVD, and others. DD-802V is powered by an AC power supply, allowing it to have a voltage range of AC 220V-380V, a frequency of 50-60Hz, and an internal power factor correction (PFC) machine. The PFC tool helps maintain a stable current flow to the furnace, which reduces energy consumption and promotes the stability of the temperature distribution. The gas delivery asset in HITACHI / KOKUSAI DD-802V helps create an inert atmosphere in the chamber, promoting the prevention of oxidation and the uniform deposition of films. The model also helps in controlling the flow rate of process gases, allowing for precise parameter control. The cooling equipment in the furnace helps reduce the temperature of deposited films so that they don't get too hot, preventing heat-induced damage. HITACHI DD-802V is able to produce a vacuum level below 0.1 Pa without the need for a vacuum pump. This feature promotes the uniform deposition of thin films and helps maintain the cleanliness of the chamber. KOKUSAI DD-802V also comes with a CIX and Mass Flow Controller (MFC), which helps in controlling the process parameters for film deposition. DD-802V is reliable, powerful, and capable of producing films of various thickness and purity levels. It is highly suitable for the manufacture of semiconductor devices and other products. The system is also safe and is capable of working efficiently in a wide range of temperatures and pressures.