Used HITACHI / KOKUSAI DD-802V #9281673 for sale

HITACHI / KOKUSAI DD-802V is a diffusion furnace and accessorie designed for use in the semiconductor industry. This type of diffusion furnace is specifically used for applications such as the production of dopants for silicon wafer manufacturing. The features of HITACHI DD-802V include a top-loading heater designed with a maximum temperature of 1250°C, allowing for temperature uniformity and repeatability. A nitrogen purge gas is available for use as a cover gas, which helps to prevent oxidation of the substrate by reducing the oxygen levels inside the furnace. The control unit is equipped with an LCD display which allows the operator to adjust the temperature and the speed of the conveyor belt. This feature facilitates precise control and accurate production of dopants. KOKUSAI DD-802V is designed with a quality framework solution to satisfy industry requirements and ensure operational safety. The PID controlled heating elements allow for precise tuning of the temperature and a Ramp-to-set feature ensures that the furnace is not subjected to any thermal shocks. Furthermore, the air intake of the furnace has built-in filters which reduce the dust concentration present in the environment, making it more environmentally friendly. The furnace is also equipped with a quartz ampoule for ampouleless loading, to minimize thermal stress as well as contamination of the semiconductor wafers. DD-802V also has a built-in hot wall feature which helps to reduce the deposition rate and uniformity of the dopant. This helps to improve overall device performance and efficiency. An exhaust system helps to remove any toxic chemicals present in air exhaust. By eliminating the risk of any possible contamination, HITACHI / KOKUSAI DD-802V ensures safe operation with the support of safety alarms. HITACHI DD-802V is a versatile tool which satisfies the demands of the semiconductor industry. The features of this furnace make it a great choice for diffusion process needs. This product is an efficient and cost-effective solution for any advanced manufacturing process which requires dopant deposition.