Used HITACHI / KOKUSAI DD-803V #293633553 for sale
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ID: 293633553
Wafer Size: 8"
Vintage: 1998
Vertical furnace, 8"
Atmospheric controller
Hand controller
CX2000 Controller
SECM / GEM Communication: Serial
Utility cabinet
CQ1501 Temperature controller
(4) Zones
D4EX02728 Heater
Process temperature: 700°C-1000°C
Flatzone length: 952.50 mm
Process tube material: Quartz
Wafer boat material: Quartz
Tube seal configuration: N2 Flow
R-Type thermocouple
Exhaust controller
Transformer
Temperature control:
P: 0.1~200%
I: 0.01-100.00 min
D: 0.00-10.00 min
Load station:
WIP Carrier capacity: 16
Wafer spacing: 5.20 ±0.05 mm
Load size: 150-Slots
Boat rotation
Process gas control system:
External torch
H2 Burn off
Bubbler
Process gas (Atmosperic):
MFC Model: SEC-Z500, SEC-4500, SEC-4400 / Analog
Process gas: N2, H2, Ar, O2, N2O
SCHUMACHER ATCS 15 Bubbler system
Other gases: UN2 (Air/N2)
Input power supply:
Heater: 208VAC, 50KVA, Single phase
Controller: 100VAC, 4KVA, Single phase
Clean Unit: 100VAC, 1.5KVA, Single phase
Start-up PSU: 24VDC
1998 vintage.
HITACHI / KOKUSAI DD-803V diffusion furnace is an advanced, reliable, and efficient tool for semiconductor manufacturers. This furnace features a gas-flow type design and can perform a variety of high temperature diffusion processes. It offers high speed, high reproducibility, and cooling capabilities. The furnace includes a gas-flow type design, which allows for a safe and even heating and cooling of the material. It also includes multiple controllers, including a temperature controller, flow controller, and pressure controller. The furnace has a wide temperature range and is capable of operating at up to 1500°C. It features advanced stirring and mixing techniques, allowing for a uniform distribution of heat in the material. The furnace also has a protective quartz tube, allowing it to operate in a vacuum environment. The furnace is equipped with an overhead mechanical system, which is designed to facilitate easy movement and loading of the furnace elements. The furnace also includes several safety features, such as a built-in thermal insulation system and an over-temperature alarm. The furnace also includes a number of extra features, such as a timer, a low temperature alarm, a high temperature alarm, and a purge timer. The furnace also features an automated control system, allowing for fine-tuned control of the process. HITACHI DD-803V diffusion furnace is also available with a variety of accessories, such as a cooling package, an alleid chuck, and an isolator. The cooling package allows for the furnace to be cooled down quickly and efficiently, while the alleid chuck helps to securely hold the substrate in the furnace. The isolator is used to protect the substrate against contamination. Overall, KOKUSAI DD-803V diffusion furnace is a reliable, efficient, and safe tool for semiconductor manufacturing. It offers a wide temperature range, advanced stirring and mixing techniques, multiple controllers, and a variety of accessories to ensure uniform diffusion processes.
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