Used HITACHI / KOKUSAI DD-803V #293633554 for sale
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ID: 293633554
Wafer Size: 8"
Vintage: 1998
Vertical furnace, 8"
Atmospheric controller
Clean unit controller
CX2000 Controller
Utility cabinet
CQ1501 Temperature controller
(4) Zones
D4EX02728 Heater
Process temperature: 700°C-1000°C
Flatzone length: 952.50 mm
Process tube material: Quartz
Wafer boat material: Quartz
Tube seal configuration: N2 Flow
R-Type thermocouple
Exhaust controller
SECM / GEM Communication: Serial
Temperature control:
P: 0.1~200%
I: 0.01-100.00 min
D: 0.00-10.00 min
Load station:
WIP Carrier capacity: 16
Wafer spacing: 5.20 ±0.05 mm
Load size: 150-Slots
Boat rotation
Process gas control system:
External torch
H2 Burn off
Bubbler
Process gas (Atmosperic):
MFC Model: SEC-Z500, SEC-4500, SEC-4400 / Analog
Process gas: N2, H2, Ar, O2, NO
SCHUMACHER ATCS 15 Bubbler system
Other gases: UN2 (Air/N2)
Input power supply:
Heater: 208VAC, 50KVA, Single phase
Controller: 100VAC, 4KVA, Single phase
Clean Unit: 100VAC, 1.5KVA, Single phase
Start-up PSU: 24VDC
Handler missing
1998 vintage.
HITACHI / KOKUSAI DD-803V diffusion furnace and accessories provide a comprehensive solution for annealing, sintering, and diffusion applications. This diffusion furnace equipment is made of a fully automated accurate Heating and Cooling Platform (HCP) and reliable action performance, which is suitable for a variety of materials and processes. HITACHI DD-803V is a versatile machine with a wide range of applications. It features four chambers, including a furnace chamber, a cooling chamber, and two auxiliaries. The furnace chamber boasts a number of features, such as digital temperature controllers, forced-air circulation, and an integral cooling chamber. The cooling chamber enables an effective cooling method for a range of materials and processes. It works efficiently with or without the help of inert gas, such as Argon. KOKUSAI DD-803V is built around a strong metal frame that offers long-lasting durability, even in harsh working environments. It is equipped with powerful ceramic insulation that improves performance and minimizes maintenance and energy costs. The furnace is controlled by a user-friendly touch-based interface, allowing for easy set-up and operation. Additionally, thanks to its built-in safety mechanisms, the furnace remains safe for use in a wide range of environments. DD-803V diffusion furnace and accessories is designed to meet the needs and requirements of many materials and processes, including semiconductor and solar cell production, research and development, thin-film applications, and medical device manufacturing. The Multi-Zone Processing System (MPS) offers advanced control of process temperatures and ambient conditions, ensuring precise and consistent results. The uniformity of the furnace chamber is maintained by the high-performance heating control unit, with adjustable zone control and an optional automated regenerative machine. In addition to the furnace, HITACHI / KOKUSAI DD-803V diffusion furnace and accessories includes a number of useful accessories. Examples include a power distribution unit, a load cell platform, fixturing systems, inert gas enclosures, and a programmable logic controller for advanced control and monitoring. HITACHI DD-803V is ideal for precise processes and sensitive components due to its precise temperature control, exceptional uniformity and reliability, and comprehensive safety features.
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