Used HITACHI / KOKUSAI DD-812V #9239651 for sale

HITACHI / KOKUSAI DD-812V
ID: 9239651
Wafer Size: 6"
Vintage: 2011
Vertical diffusion furnace, 6" 2011 vintage.
HITACHI / KOKUSAI DD-812V is a diffusion furnace and accessories equipment designed to provide precise control of the diffusion furnaces used in the semiconductor and other industries. It facilitates easy and accurate operation, ensuring maximum productivity and reliability with minimum downtime. The furnace has a capable and versatile design, and allows for heating in batch or continuous mode. Its automated temperature control systems are equipped with high-precision temperature sensors, allowing accurate and stable temperatures. Using built-in power supplies, the temperature can be precisely adjusted with sensitive temperature control, providing cost savings with improved process repeatability. Aside from the furnace itself, the system includes a variety of components including a gas injector, pressure transducer, fans and other peripherals. The gas injector efficiently distributes gas into the furnace chamber, consisting of a venturi throat, which can also be used to purge hydrogen-bearing gases. The pressure transducer measures the gas pressure and can be used as a means for detecting and correcting gas supply errors during processing. Other accessories include a process hopper, muffles, susceptors, workstation carriage, chamber assembly, and process control systems. In addition, HITACHI DD-812V is designed to reduce particle contamination, optimizing chamber temperature uniformity and creating a far better process environment. This is especially important in applications involving ultra-high-density wafer fabrication and processing. It also features a comprehensive remote monitoring and diagnostics unit, enabling continuous monitoring for optimum equipment performance. Overall, KOKUSAI DD 812V machine from HITACHI is an advanced and reliable diffusion furnace designed to provide precise control with minimal downtime. It offers a wide range of adjustable variables, flexible components, and improved process repeatability, ensuring the best results for semiconductor and other process industries.
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