Used HITACHI / KOKUSAI DD-812V #9397458 for sale

HITACHI / KOKUSAI DD-812V diffusion furnace is designed for oxidation and rapid thermal annealing applications. With an 8-inch diameter quartz tube, it offers excellent uniformity and tight process control. The furnace can process both oxide and nitride films. Its high temperature capability up to 1250°C and repeatability accuracy of +/- 0.1°C ensures reliable and consistent results for demanding processes such as semiconductor device manufacturing. HITACHI DD-812V features a unique zone control equipment, allowing for precise heating profiles for process optimization. It is equipped with two independently controlled heaters and two quartz tube holders which permit operation at process temperatures from room temperature to 1250° C. The furnace also provides comprehensive monitoring through alarms, thermal counters and process control logic. KOKUSAI DD 812V is equipped with multiple accessories such as a turbo pump, a backing pump, a quartz bell jar, a chill plate and a foot pedal controller. The turbo pump allows for the efficient removal of gas molecules during the oxidation process, while the backing pump prevents air intake. The quartz bell jar is used to ensure that the process environment is maintained, while the chill plate reduces the risk of thermal shock. Finally, the foot pedal provides additional control, allowing you to precisely adjust the heat setting and start/stop the furnace. DD 812V offers a comprehensive range of safety features including over-temperature protection and a thermal interlock system. This ensures that the process remains safe and stable, allowing for reliable operation even during long-running processes. The unit is also capable of storing up to ten operating menus and can log up to three temperature profiles. HITACHI DD 812V diffusion furnace is a powerful and reliable machine, with excellent process control and repeatability for oxide and nitride films. Its easy-to-use controls and features, combined with advanced safety features make it an ideal choice for a variety of diffusion and annealing processes.