Used HITACHI / KOKUSAI DD-853V-8BL2 #9182447 for sale

HITACHI / KOKUSAI DD-853V-8BL2 is a type of diffusion furnace specifically designed for basic research, as well as semiconductor application. It is a high-performance, single-floor furnace equipment, capable of elevating temperature up to 1300°C, while providing uniform thermal processing. The system is mainly used for the deposition, epitaxy, annealing, oxidation, and diffusion of various materials, including semiconductors, metals and powders. The diffusion furnace is made up of three main components: the main body, loaded with electronic and temperature control components; the circulating fan and air shower unit; and the base assembly. The main unit consists of a furnace body, an electronic thermometer, a back side-mounted gas heating unit, and a cooling fan assembly. The cooling fan assembly allows the efficient removal of heat and temperature variations from the furnace. The furnace is equipped with a circuit-protected vacuum seal to provide optimal temperature control. The circulating fan and air shower machine in HITACHI DD-853V-8BL2 ensures uniform thermal processing. The unit consists of a top electrical controller-sub controller, a rotor-type blower fan, and a three-phased motor. The circulating fan, along with the integrated air shower tool, helps to achieve uniform temperature distribution in the chamber. KOKUSAI DD-853V-8BL2 is designed for easy operation. The main body is constructed with an ergonomic design, with easy-to-use control panel, allowing for easy monitoring and adjustment of the processing temperature. DD-853V-8BL2 offers reliable and powerful diffusion furnace technology for laboratory settings. It is specifically designed for basic research and semiconductor applications and can achieve temperatures up to 1300°C with uniform thermal processing. The unit is constructed with a convenient control panel and is easy to use and maintain. This high-performance diffusion furnace is ideal for any research laboratory or semiconductor production facility that requires precision temperature control.