Used HITACHI / KOKUSAI DJ-1206V-DF #9251678 for sale

HITACHI / KOKUSAI DJ-1206V-DF
ID: 9251678
Wafer Size: 12"
Vintage: 2007
LPCVD Systems, 12" Quixace 2 2007 vintage.
HITACHI / KOKUSAI DJ-1206V-DF is a diffusion furnace designed for semiconductor device processing. It is a low-pressure chemical vapor deposition (LPCVD) furnace capable of performing high-temperature reaction processes of up to 1000°C. This high thermal processing temperature makes HITACHI DJ-1206V-DF a versatile tool perfect for applications ranging from annealing to oxidation, nitridation, and even silicon epitaxy. The diffusion furnace and accessories come in a single unit, allowing for greater ease of installation and operation. It features an LPCVD chamber with a 3″ diameter quartz viewport for clean inline vision of both the process and sample. The unit also comes with a quad-zone controller, allowing for precise temperature control within each specific process zone. The controller is integrated with a combustion gas selection equipment, an ultra-sensitive pyrometer and quartz sampling tube for real time feedback of temperature and other process related readings. The diffusion furnace is designed with an exclusive drift-control system, ensuring precision control of temperature in each zone. This ensures temperature stability and accuracy at all levels and across all processes. The unit also provides process flexibility enabling the creation of complex layer structures. All of these features ensure a repeatable and reliable process. For added safety the unit features a state-of-the-art nine-point protection unit. This security machine monitors gas flow, pressure, temperature, and chamber content to safeguard the manufacturing environment. Additionally, a thermal insulation lid is added to reduce energy usage and minimize noise levels. For added convenience, the diffusion furnace comes with a wide range of accessories. This includes a 360 degree material pick-up arm, allowing for full access to the sample in all process zones. It also includes a purging station for lowering the risk of oxidation, and a multiple zone calibration station for temperature accuracy verification. Finally, the unit is controlled via a computer-integrated software tool, allowing for maximum control and flexibility. KOKUSAI DJ-1206V-DF diffusion furnace is an advanced piece of equipment engineered for optimal performances, precision control, and enhanced safety. Its wide range of accessories allows for highly specialized processes to be performed quickly and easily. This state of the art unit is perfect for all semiconductor device processing needs.
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