Used HITACHI / KOKUSAI DJ-1206V-DF #9285009 for sale

HITACHI / KOKUSAI DJ-1206V-DF
ID: 9285009
CVD Systems Type: Si3N4.
HITACHI / KOKUSAI DJ-1206V-DF is a diffusion furnace and accessories designed for the production of semiconductor and electronic components. HITACHI DJ-1206V-DF is specifically designed for efficient thermal processing of precision semiconductor devices with maximum reliability. The furnace features rapid heating and cooling rates for precise temperature control within a thermally-resistant chamber. The furnace also boasts excellent uniformity and temperature stability, with a maximum temperature of 1180°C. Additionally, the furnace is equipped with a number of automatic features, including self-diagnostics, hot zone monitoring, programmable equipment hierarchy and more. The diffuser assembly and lid are manufactured from the highest quality materials to ensure safety and preservation. The furnace lid system is designed to ensure even thermal distribution throughout the chamber with no danger of hot spots or burn-outs. The diffuser features dual high-velocity gas diffusion systems that create a homogeneous atmosphere and provide uniform heat throughout the chamber. The diffusion furnace is also equipped with a number of accessories, such as an active gas control unit, sample holders, atmosphere control machine and more. The active gas control systemfeatures automatic flow control, atmosphere composition monitoring and recording, and digital pressure/temperature readouts, offering accurate, real-time feedback. The sample holders are designed to securely hold the samples in place during processing, with a range of different holders available for varying form factors. Additionally, the atmosphere control tool provides automated control of process gases, ensuring that the optimal process parameters are maintained at all times. In short, KOKUSAI DJ-1206V-DF diffusion furnace is an incredibly reliable and efficient piece of equipment offering optimal temperature control, uniform temperature monitoring and gas composition control. As such, it is an ideal choice for anyone looking for an advanced thermal processing solution.
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