Used HITACHI / KOKUSAI DJ-1206V #9377252 for sale

HITACHI / KOKUSAI DJ-1206V
ID: 9377252
Wafer Size: 2007
Furnace, 12" Process: HTO 2007 vintage.
HITACHI / KOKUSAI DJ-1206V is a diffusion furnace designed to perform various thermal processes used in semiconductor device manufacturing. It is a rapid thermal processing tool which uses radiation to heat samples to temperatures up to 1400°C. The temperature uniformity is maintained throughout the chamber with its multiple quartz radiation lamps. Additionally, the chamber is made of stainless steel and equipped with a ceramic helium gas distribution plate. This ensures the even distribution of prim gases and consistent heating. Various features of HITACHI DJ-1206V make it an ideal choice for the user. An automatic cleaning mechanism enables it to efficiently keep its internal surfaces clean throughout the process. It can also automatically detect and display any air leaks in the chamber. The diffusion furnace also includes an interface equipment for data collection and monitoring. This includes a Windows-based software package and a graphical user interface. The furnace comes with several accessories including a gas supply system, pressure transducers, heaters, and heating elements. This unit is designed to provide a reliable gas supply and allow for easy adjustment of the settings during operation. The pressure transducers measure the pressure in the chamber in order to ensure that it is within the safety range. The heaters and heating elements help maintain the temperature uniformity inside the chamber by using their device to transfer heat from the heater element to the substrate. In addition to the internal components, KOKUSAI DJ-1206V also includes an environmental monitoring machine. This tool is designed to monitor any changes or deviations in the gas composition or pressure. If the variations exceed the boundaries set in the software, the asset is capable of automatically making adjustments and notifying the user. Overall, DJ-1206V diffusion furnace is an advanced and reliable tool which can provide high-end thermal processing for many different types of semiconductor devices. It can be used in various industrial settings and is suitable for use in a wide range of applications.
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