Used HITACHI / KOKUSAI DJ-1206VN-DM #9400342 for sale

ID: 9400342
Wafer Size: 12"
Vintage: 2005
Vertical LPCVD furnace, 12" Process: Nitride Wafer transfer handling system (2) FOUPs 507 BW Mat scrubber EST300WN Pump 2005 vintage.
HITACHI / KOKUSAI DJ-1206VN-DM is a diffusion furnace and accessory device used primarily in the semiconductor industry. It combines both a high-vacuum and low-vacuum furnace to provide a single solution to manufacturing processes such as oxidation, deposition, nitriding and gettering. Unlike other diffusion furnaces which can vary in size, this model is a medium-sized diffusion furnace, measuring roughly 600mm (w) x 600mm (d) x 600mm (h). The furnace utilizes a quartz crystal for temperature monitoring and control for specific processes. The inner chamber of the furnace is made from Type Q quartz, providing excellent heat conductivity and temperature consistency during the process. It is lined with a gettering nickel material for improved efficiency and maximum temperature uniformity. The unit also boasts multi-zone temperature control for superior oxidation, deposition, nitriding and gettering performance. This allows multiple areas of the chamber to be heated at different temperatures, enabling uniform control of the temperate across the chamber. HITACHI DJ-1206VN-DM also provides an atmosphere control equipment using nitrogen or argon gases. This system assists with the uniform mixing of gases and preventing potential contamination. The device also includes a number of safety features such as a pressure and temperature monitoring unit, emergency interlocks and low-voltage alarms. It also includes auto-resetting of the high-temperature safety limit, a back-pressure control machine, an interlock-free valve, an emergency venting tool, and a thermal insulation monitoring asset. KOKUSAI DJ-1206VN-DM diffusion furnace is designed for superior performance and accuracy in diffusion processes. It is a reliable and dependable solution for the semiconductor industry. Its robust construction, combined with its comprehensive safety features and versatile atmosphere control, make it an excellent choice for any diffusion-based application.
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