Used HITACHI / KOKUSAI DJ-1206VN #9311080 for sale

HITACHI / KOKUSAI DJ-1206VN
ID: 9311080
Vintage: 2008
Diffusion system Process: DIFF 2008 vintage.
HITACHI / KOKUSAI DJ-1206VN is a versatile, cutting-edge diffusion furnace equipment that can be used in a variety of semiconductor processing applications. It is equipped with a low temperature vacuum diffusion furnace capable of processing wafers between 400℃ and 1000℃. The system offers high-precision, efficient and cost-effective processing for the ramp-up and ramp-down of diffusion and oxidation temperatures. HITACHI DJ-1206VN unit features a high-acceleration rate with low thermal-disturbance stage, allowing for rapid diffusion and oxidation of wafers over a wide range of temperatures. The machine also features precise control over flow rates, atmospheric gas composition and pressure with micro-flow control technology. This permits selective processing and increases the speed and efficiency of the diffusion process. In addition to the furnace, the tool comes with a wide selection of accessories designed to ensure the highest level of safety and accuracy. These include a variety of feed-throughs and control systems to help ensure accurate and consistent operation. The asset also includes a high-precision temperature control with thermoelectric pyrometers, stainless steel high vacuum vessels and intuitive heating control. KOKUSAI DJ1206VN model is designed with a user friendly interface, providing easy access to all equipment controls. This makes it easy for users to program and monitor the system during operation. A graphical user interface displays detailed process information, making the unit easy to use. The machine also features a variety of safety features, such as the cooling tool shutoff and shut-off combustible gas if the furnace temperature exceeds a set limit. Overall, KOKUSAI DJ-1206VN is a powerful and reliable diffusion furnace asset that provides consistent and precise output with a wide range of temperature control. With its high acceleration rate and low thermal-disturbance stage, this model is ideal for efficient and cost-effective diffusion and oxidation of wafers. The accessory package provides a wide range of additional features to ensure accurate and consistent operation. In conclusion, DJ-1206VN is an excellent choice for fast, safe, and effective diffusion and oxidation processes.
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