Used HITACHI / KOKUSAI DJ-1207S-DD #293764511 for sale
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ID: 293764511
Vintage: 2006
CVD System
(5) Gas boxes
(4) Power boxes
(4) Chambers
(4) Chillers
(6) Quartz carriers
(2) Transformers
FI Unit
Loading machine:
(4) TDK Loaders
YASKAWA Manipulator
2006 vintage.
HITACHI / KOKUSAI DJ-1207S-DD is a state-of-the-art diffusion furnace designed for semiconductor manufacturing processes. This advanced piece of equipment is essential for the precise and controlled diffusion of dopants into silicon wafers, a critical step in the production of semiconductor devices. HITACHI DJ-1207S-DD model offers a high level of performance and reliability, making it a popular choice among semiconductor manufacturers worldwide. Key Features: 1. Dual-Tube Design: KOKUSAI DJ-1207S-DD features a dual-tube design, allowing for simultaneous processing of two separate batches of silicon wafers. This dual-tube configuration increases throughput and efficiency, reducing overall processing time and increasing the productivity of the manufacturing line. 2. Digital Control Equipment: DJ-1207S-DD is equipped with a sophisticated digital control system that allows for precise control of process parameters such as temperature, gas flow rates, and pressure. This advanced control unit ensures consistent and reliable diffusion results, leading to high-quality semiconductor devices. 3. Uniform Heating: The furnace is designed to provide uniform heating across the entire wafer surface, ensuring consistent diffusion profiles and minimizing variations in dopant concentration. This uniform heating is achieved through a combination of high-quality heating elements and optimized gas flow patterns within the furnace chamber. 4. Gas Handling Machine: HITACHI / KOKUSAI DJ-1207S-DD is equipped with a comprehensive gas handling tool that allows for precise control of dopant gases such as phosphine, diborane, and arsine. The gas handling asset includes mass flow controllers, gas purifiers, and pressure regulators to maintain the purity and stability of the dopant gases throughout the diffusion process. 5. Safety Features: The diffusion furnace is designed with multiple safety features to ensure the well-being of operators and prevent accidents. These safety features include over-temperature protection, gas leak detection systems, and emergency shutdown mechanisms to quickly isolate the furnace in case of an anomaly. 6. Automated Process Control: HITACHI DJ-1207S-DD is equipped with an automated process control model that allows for recipe-based programming and remote operation. This automation capability streamlines the manufacturing process, reduces the potential for human error, and increases the overall efficiency of the diffusion process. 7. Maintenance and Serviceability: KOKUSAI DJ-1207S-DD is designed for easy maintenance and serviceability, with accessible components and diagnostic features that simplify troubleshooting and repair. Regular maintenance procedures are clearly outlined in the user manual, enabling operators to keep the furnace running smoothly and efficiently. Overall, DJ-1207S-DD diffusion furnace is a reliable and highly advanced piece of equipment that plays a crucial role in the manufacturing of semiconductor devices. With its dual-tube design, digital control equipment, uniform heating capabilities, and comprehensive safety features, this diffusion furnace offers semiconductor manufacturers a versatile and efficient solution for their diffusion processing needs.
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