Used HITACHI / KOKUSAI DJ-1223VN #9377457 for sale

HITACHI / KOKUSAI DJ-1223VN
ID: 9377457
Wafer Size: 12"
Vintage: 2006
Diffusion furnace, 12" Type: SI3N4 2006 vintage.
HITACHI / KOKUSAI DJ-1223VN is an advanced diffusion furnace used for the fabrication of semiconductor device. It is a combination of revolutionary heating and cooling technology, along with precise control over processing conditions. This furnace has an unique high-emissivity susceptor, and a superconductive interlocking susceptor structure, which offers superb thermal and electrical linearity and uniformity to homogenous heat distribution. This is achieved through an optimized susceptor/refractory combination that maximizes utilization of the high-frequency energy. The furnace has excellent flexibility, with multiple operating modes, such an EFEM and EFEM+LP modes, to accommodate various process recipes. It's equipped with a gas selection valve that allows for precise and controlled gas mixture. It also has an active-closed loop for temperature and gas pressure control. The furnace's programmable controllers have a wide range of control functions such as auto-tuning, auto-cleaning, auto-venting, vacuum and pump control, and timing functions. The controller also supports intelligent diagnostic functions, which facilitate automatic tune-up and troubleshooting. This feature is especially useful when batch processing is required. The diffusion furnace features easy maintenance, with an easily exchangeable ceramic frame. It is also integrated with a self-cleaning mechanism for easy maintenance. Additionally, it has a unique heat-sinking system that minimizes the occurrence of hotspots. HITACHI DJ-1223VN comes with special sensors and safety devices, such as a pressure sensor to detect gas leakage, temperature sensors for monitoring melting point, and inert gas leak detector for ensuring inert atmosphere. It also has an insulation guard and auto-stop on water-flushing double protection to prevent occurrence of electric shock. KOKUSAI DJ1223VN diffusion furnace also offers excellent reproduction and reliability. It features advanced harmonic compensation to prevent noise interference during operation, and employs cross-conditioning techniques that ensure uniformity in thermal gradients across the area of operations. In addition, it has a pressure control system and quick-sealing system which allow compressor to remain in operation until process is completed. To sum it up, DJ1223VN is an extremely advanced and reliable diffusion furnace which offers excellent thermal control, uniformity, and reliability. It also offers exceptional safety features along with precise control over the processing conditions, making it an ideal choice for semiconductor device fabrication.
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