Used HITACHI / KOKUSAI DJ-802V-B #9211004 for sale

HITACHI / KOKUSAI DJ-802V-B is a diffusion furnace and accessories equipment that has been designed for reliable and precise silicon wafer processing. It is suitable for semiconductor, solar cell, and other nanotechnology applications that require an efficient and accurate diffusion process. This system is powered by a high-quality, low voltage, and thermal diffusion power supply. The unit also includes a diffusion furnace that features a single-heating chamber, a nitrogen-filled atmo-sphere, and water-cooled walls. This machine comes with a variety of accessories, including an optical pyrometer, an analog display for temperature setting, an air control, a sample holder, a safety switch, and a silicon crucible. The diffusion furnace in this tool has a temperature range of 0°C to 1400°C and a maximum temperature of 1450°C. It is available with different crucible sizes, including 5, 7, 10, 14, and 20 inches. This asset is designed to be highly accurate and has a precision of ± 0.5°C. It is also equipped with a timer and ammeter for enhanced performance. The large surface area of the heating chamber ensures even and uniform heating of the wafers. The temperature uniformity within the furnace is also excellent, with a tolerance of ±3°C. The model also includes an atmospheric control module that includes an N2 gas controlling equipment, an argon purging system, and oxygen sensors to sustain a nitrogen atmosphere. The optional optical pyrometer helps achieve greater temperature monitoring accuracy. The sample holder ensures stable placement of the silicon wafers in the furnace chamber. HITACHI DJ-802V-B diffusion furnace and accessories unit provides users with a reliable and highly accurate diffusion process. This machine offers a wide range of accessories that allow operators to easily customize the processing conditions to achieve optimal results. The included air control module also helps to maintain the nitrogen atmosphere inside the furnace chamber, ensuring an efficient diffusion process.