Used HITACHI / KOKUSAI DJ-802V-H #293595916 for sale

ID: 293595916
Vintage: 2012
LPCVD Furnace 2012 vintage.
HITACHI / KOKUSAI DJ-802V-H is a highly efficient and reliable diffusion furnace and accessory package designed for fast and effective thermal processing. It is capable of delivering temperatures of up to 1200°C and its compatible with a wide range of substrates including silicon, metals, ceramics, and polymers. Its superior insulation design ensures superior temperature uniformity and reproducibility, giving users reliable results for every cycle. The chamber is equipped with a high vacuum sensor and chamber pressure monitor, allowing for extremely accurate vacuum readings, as well as pressure control to meet demands from 0.15 Pa to atmospheric. The unit also features a heavy duty wafer handling equipment and a 'probe' system for thermal mapping of wafers. The integral computer-controlled type PID temperature controller, provides stable temperature control and repeatable heating curves, while the alloy muffle and graphite heater provide rapid heating and cooling rates. The chamber structure is composed of SUS304 and a flange design to make the chamber more stable and safer to operate. The chamber has three standard ports, which allow for the installation of multiple re-circulating pipelines, making it easier to control the temperature. The built-in wafer loading and unloading platform also allows for two way movements to avoid collision with the heat-resistant materials. The accompanying accessories provide all the necessary tools for a successful thermal processing run. The high-performance quartz tube provides a high temperature and fast heating, making it safer for the operator. It is designed for compatibility with multiple substrates. The furnace also comes with 2 gas switching devices, an EGA gas mixer, and a gas pressure monitor for precise gas control. The supporting exhaust unit monitors the gas flow with a gas pressure monitor, ensuring reliable operation and safety. An independent cooling drainage is provided to help cool the device, by allowing the hot gas to flow away from the furnace to an exhaust machine. Additionally, an adapted cover provides extra protection and a connection port for additional peripherals. HITACHI DJ-802V-H diffusion furnace and accessorie package is an ideal solution for applications where accuracy and repeatability is a must. Its superior design and features ensure optimal performance, uniformity, and reliability. With its wide range of compatible substrates, this highly efficient dynamic chamber is sure to satisfy the needs of any thermal processing professional.
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