Used HITACHI / KOKUSAI DJ-802V-H #9226003 for sale

HITACHI / KOKUSAI DJ-802V-H is a diffusion furnace designed to provide heat treatments for silicon wafers. It is the perfect tool for the production of high purity diffusion coating. HITACHI DJ-802V-H is equipped with a resistively heated graphite susceptor and cooling fan for rapid temperature cycling. It can reach set temperatures up to 1000°C and is perfect for applications where high thermal efficiency and thermal uniformity are required. KOKUSAI DJ-802V-H is composed of a special graphite crucible containing a resistively heated graphite susceptor and a cooling fan for efficient temperature cycling. The crucible is supported on a frame which contains electronic, mechanical, cooling and power components. It has a vertically opening door that provides unrestricted access to the interior. The temperature of DJ-802V-H is controlled by two independent thermocouples and PID regulation, which provides accurate and repeatable temperature control capabilities. It also has two PID ramps for programmed temperature profiles. It has an audible alarm, low-noise water circulation equipment and over temperature protection system. The design of HITACHI / KOKUSAI DJ-802V-H is based on a special graphite crucible and framing for increased concentricity and thermal homogeneity. HITACHI DJ-802V-H is equipped with additional accessories such as a stainless steel accessory basket, a quartz thyristor insulator tube, sample retort holder and RFID auto-detection unit. The sample retort holder is designed to provide uniform heating of the sample in a tightly sealed environment. The RFID auto-detection machine ensures the correct dosage of the chemicals used in the graphite susceptor. In conclusion, KOKUSAI DJ-802V-H is a state-of-the-art diffusion furnace that is ideal for high purity coating on silicon wafers. It is equipped with a range of advanced features and accessories such as PID regulation, low-noise water circulation and RFID auto-detection tool. It also comes with variable temperature control and superior levels of thermal homogeneity, making it the perfect solution for a variety of heat treating applications.