Used KE DD-1223V #293626085 for sale

KE DD-1223V is a high-performance vacuum diffusion furnace and accessories package. This powerful equipment is ideal for a wide range of diffusion activities, from industrial coating processes to research and development. The integrated temperature controller and precise heating capabilities make this device ideal for precise and precise temperature control. DD-1223V diffusion furnace consists of two main components: a ceramic tube furnace and a vacuum equipment. The ceramic tube furnace is constructed from a ceramic heating element and insulation material, which ensures precise temperature control and even heating, while the vacuum system is designed to create an oxygen- and gas-free environment. The device is also equipped with air and nitrogen backfilling capabilities, further enabling accurate processing under precise low-pressure conditions. KE DD-1223V furnace is designed to be synchronized with various accessorie packages, such as the LPC-300-MK, LPC-500-MK and HPC-500-F1. Each package comes with a set of control valves, gas delivery unit, a variety of roller and pan dies, and a cryo-cooler, allowing for a wide range of temperature control applications. This gives users access to an extremely high quality diffusion process, ensuring the consistency, accuracy, and safety of the final products. The device is fully automated and digitally operated, with a graphical user interface and built-in error-correcting algorithms. The machine is designed to automatically detect all types of errors and respond in a timely manner, thus ensuring the efficiency and accuracy of the diffusion process. Additionally, this device is extremely light-weight, making it portable, and energy efficient, helping to conserve energy and reduce the carbon footprint of the user. DD-1223V is an ideal choice for industrial, research, and development applications for its robust construction, precise temperature control, advanced accessories and easy automation. The vacuum tool and backfilling capabilities further enhance its performance, making this device a reliable and dependable choice for diffusion processes.