Used KE DD-823V #9364541 for sale
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KE DD-823V diffusion furnace is a powerful, reliable and robust deposition device designed for high-volume and selective-area semiconductor wafer processing. It uses the unique pulsed-dynamic diffusion heating equipment to provide uniform high-temperature heating for a wide range of processes such as PECVD, CVD, rapid thermal annealing and dielectric deposition. DD-823V is also equipped with improved vertical drive motors which enable precise zone control of up to eight horizontally mounted cassette loading gates. This feature allows maximum flexibility for fast transition between different processes. The furnace also includes a three-way safety switch system to monitor cassette, chamber and lid temperatures to ensure safety and reliability. Additionally, the maximum chamber temperature is programmed to meet process requirements. The integrated control unit of KE DD-823V provides accurate process temperature control and user-friendly operation. It also comes with a process controller and safety monitor, both with built-in sensors, as well as programmable alarm and status functions. Interchangeable gas panels control the heated zone for a better chamber uniformity. DD-823V also features a touch-screen graphical user interface that allows quick and easy access to processing parameters. KE DD-823V is also designed with innovative and user-friendly maintenance features. Its unique self-monitoring capabilities enable a rapid response to abnormal condition and enable both non-disruptive maintenance as well as continuous monitoring of chamber conditions. The device is also equipped with a removable gas panel for periodic cleaning and inspection. The furnace also comes with a short cycle door so that parts can be replaced quickly and without interference. In addition, the furnace can be operated in either manual or automatic modes, so it can be easily adjusted to meet any process requirement. In summary, DD-823V diffusion furnace is a powerful and reliable machine that offers fast transition between processes and precise zone control. It is equipped with a versatile control machine, a modular gas panel, and an easy-to-use maintenance feature. This model is a great solution for high-volume and selective-area semiconductor wafer processing.
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