Used KOKUSAI Aldinna DJ-1206VN-DM #182677 for sale
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ID: 182677
Wafer Size: 12"
Vintage: 2008
Atomic Layer Deposition system, 12"
ALD: SiN
2008 vintage.
KOKUSAI Aldinna DJ-1206VN-DM is a top-of-the-line diffusion furnace and accessories kit designed to make reliable and high-performance deposition and vaporization processes. It features a 4-zone equipment, with a digital controller to ensure precise temperature control, airflow, and vacuum control. The built-in 12" RF generator allows for the deposition of many materials, including the semiconductor device type materials. The high temperature phase of diffusion processes is achieved through multi-directional infrared heating that is provided by built-in dichroic reflectors, with advanced pyrometers ensuring uniform temperatures in the chamber. The furnace also contains a safety door, as well as double-walled vacuum chamber walls to reduce heat loss. The kit includes a water condenser and sublimator to enhance the deposition of both conductive and insulative materials. Both the condenser and sublimator come with a built-in tri-level cooling system and temperature controlled fan. The unit also features a dual growth mechanism that helps to deposit multiple layers at once. It also provides a high level of control over the gas mixtures used, as well as the pressure in the chamber. The digital-controller allows for user-defined processes with data logging and computer control, as well as incident reports for troubleshooting. The touch-screen interface is easy-to-use, and the machine allows for programming up to 10 recipes that can be stored and transferred to other units. Aldinna DJ-1206VN-DM also comes with a full software package and library for controlling the tool, collecting data, and monitoring processes. Overall, KOKUSAI Aldinna DJ-1206VN-DM is a highly advanced diffusion furnace and accessories kit designed to provide consistent results and superior performance. Its 4-zone asset and range of features give users the capability to deposit and vaporize all types of materials in an efficient and precise manner. With a full software package, dual growth mechanism, and reliable temperature control, this model is an ideal choice for vapor deposition and diffusion.
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