Used KOKUSAI CQ1710 TC#1 #293597881 for sale

KOKUSAI CQ1710 TC#1 is a specialized diffusion furnace and its associated accessories designed for the fabrication and research of semiconductor substrates. Equipped with a high temperature furnace, top-loading crucible, manual and power zoned thermal sources, gas bubbling, vacuum and a range of other features, it can be used for high accuracy applications such as doping, SiGe growth and oxidation. KOKUSAI CQ1710 TC#1 diffusion furnace has a maximum temperature of 1700 degrees Celsius (3,092 degrees Fahrenheit) and a rate of temperature increase of up to 80 degrees Celsius per hour. It is made of durable quartz fiber as well as stainless steel, allowing for maximum thermal insulation and low power usage. Its unique gas injection equipment ensures uniformity of gas injected at the substrate level, while the bubbler function allows inert gases to be bubbled into the system at set flow rates. KOKUSAI CQ1710 TC#1 also includes an automated top-loading crucible unit and a manual and power-controlled thermal sources. The top-loading crucible machine is designed to automate substrate loading and transfers to the heated chamber. The manual and power-controlled thermal sources provide precise and accurately regulated temperature control for a range of processes, including diffusion, oxidation, deposition and growth. The machine also features a range of accessories and configurations to accommodate a variety of substrates and to allow for different operating parameters such as gas flow and RF power levels. These include a power regulated exhaust, a process monitor for observation of the substrate, a multi element detector for monitoring solid and liquid phase composition, a thermocouple for thermal measurement, manual and automated gas bubblers and an intensity control panel for handling substrate carriers and gas supplies. KOKUSAI CQ1710 TC#1 is a highly versatile and reliable diffusion furnace ideal for research and device fabrication. With its advanced top-loading crucible and manual and power-controlled thermal sources, it offers a range of processing parameters capable of tackling a variety of materials. Built with premium materials to ensure maximum thermal insulation and minimal power consumption, it is the ideal instrument for use in highly-demanding semiconductor applications.