Used KOKUSAI CX-3000 #293762569 for sale

KOKUSAI CX-3000
ID: 293762569
Wafer Size: 12"
Vintage: 2006
Diffusion furnace, 12" P/N: DJ-1223VN Process: SI3N4 Main controller: CX3010 / CX3010B Power supply: 208 V, 1 Phase / 440 V, 3 Phase 2006 vintage.
KOKUSAI CX3000 is a state-of-the-art diffusion furnace equipment designed for precise and reliable thermal processing of silicon wafers in semiconductor manufacturing. This versatile and highly automated system offers advanced features and capabilities to meet the stringent requirements of the semiconductor industry. KOKUSAI CX-3000 is equipped with a horizontal tube furnace that provides a controlled and uniform thermal environment for the diffusion process. The unit is capable of supporting various processes such as oxidation, diffusion, annealing, and deposition, making it a versatile tool for advanced semiconductor fabrication. One of the key features of CX3000 is its advanced temperature control machine, which ensures precise and stable thermal profiles throughout the process. The tool is equipped with multiple heating zones and thermal sensors to monitor and control the temperature with high accuracy. This allows for optimal process control and repeatability, ensuring consistent results across wafers and batches. In addition to temperature control, CX-3000 offers a range of gas flow and mixing capabilities for precise process gas delivery. The asset is equipped with mass flow controllers for accurate control of gas flow rates, as well as gas mixing capabilities for creating custom gas atmospheres tailored to specific process requirements. This level of control enables users to achieve precise process conditions and uniformity across the wafer surface. KOKUSAI CX3000 also features a user-friendly interface with intuitive software control for easy operation and monitoring of the process. The model can be programmed with a variety of process recipes and parameters, allowing users to easily set up and run different processes with minimal manual intervention. Additionally, the equipment is equipped with advanced data logging and analysis capabilities for real-time monitoring and process optimization. In terms of safety and reliability, KOKUSAI CX-3000 is designed with robust safety features to ensure operator protection and equipment integrity. The system is equipped with safety interlocks, gas detection sensors, and emergency shutdown capabilities to prevent accidents and ensure a safe operating environment. Additionally, the unit is built with high-quality components and materials to ensure long-term reliability and performance. For enhanced productivity and efficiency, CX3000 is designed with a modular configuration that allows for easy integration with other process equipment and automation systems. The machine can be customized with various accessories and options to meet specific process requirements and production needs. This scalability and flexibility make CX-3000 an ideal solution for both R&D and high-volume production environments. Overall, KOKUSAI CX3000 diffusion furnace tool offers cutting-edge technology, advanced capabilities, and robust performance for demanding semiconductor processing applications. With its precise temperature control, gas flow management, user-friendly interface, and safety features, KOKUSAI CX-3000 provides a reliable and efficient solution for achieving high-quality semiconductor devices in the ever-evolving semiconductor industry.
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