Used KOKUSAI CX-3000 #293762968 for sale

KOKUSAI CX-3000
ID: 293762968
Wafer Size: 12"
Vintage: 2004
Diffusion furnace, 12" P/N:DD-1223VN Process: BIO Main controller: CX3010 / CX3010B Power supply: 208V, 1 Phase / 440 V, 3 Phase 2004 vintage.
KOKUSAI CX-3000 is a state-of-the-art diffusion furnace equipment designed for the precise and efficient processing of semiconductor substrates. This high-performance equipment is a crucial component in semiconductor fabrication facilities, enabling the diffusion of dopants into silicon wafers to create the necessary electrical characteristics for integrated circuits and other semiconductor devices. KOKUSAI CX3000 features a vertical furnace design that allows for uniform heating and diffusion across multiple wafers simultaneously. This system is equipped with advanced temperature control mechanisms, enabling precise control over the doping process for optimal performance and yield. The furnace chamber is constructed with high-purity materials to ensure minimal contamination and maintain a clean processing environment. One of the key capabilities of CX-3000 is its ability to accommodate a wide range of diffusion processes, including phosphorus, boron, arsenic, and other dopants commonly used in semiconductor manufacturing. The unit is designed to deliver excellent repeatability and consistency in doping profiles, crucial for achieving tight process control and meeting stringent device performance requirements. CX3000 is also equipped with a range of accessories and options to enhance its functionality and flexibility in various semiconductor processing applications. This includes a comprehensive gas delivery machine for precise introduction of dopant gases into the furnace chamber, as well as a sophisticated control tool for monitoring and adjusting process parameters in real time. In addition to its diffusion capabilities, KOKUSAI CX-3000 can be integrated into a comprehensive semiconductor manufacturing line, allowing for seamless automation and control of the entire wafer processing workflow. The asset's compatibility with industry-standard automation interfaces and software protocols ensures easy integration into existing fab environments, enabling efficient production scaling and process optimization. KOKUSAI CX3000 is designed with a focus on reliability, durability, and ease of maintenance to maximize uptime and productivity in semiconductor fabrication operations. The model is engineered to deliver long-term performance and stability, with robust construction and quality components that withstand the demands of high-volume manufacturing environments. Overall, CX-3000 represents a cutting-edge solution for diffusion furnace processing in semiconductor manufacturing, offering advanced capabilities, precise control, and flexibility to meet the evolving needs of the industry. With its state-of-the-art design, comprehensive features, and integration capabilities, CX3000 is a valuable tool for achieving high-quality, high-performance semiconductor devices in today's competitive market.
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