Used KOKUSAI CX-3000 #293762971 for sale
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ID: 293762971
Wafer Size: 12"
Vintage: 2007
Diffusion furnace, 12"
P/N: DD-1223VN
Process: SI3N4
Main controller: CX3010 / CX3010B
Power supply: 208V, 1 Phase / 440 V, 3 Phase
2007 vintage.
KOKUSAI CX-3000 is a state-of-the-art diffusion furnace designed for precise and uniform processing of semiconductor wafers in semiconductor manufacturing and research institutes. This high-performance furnace is equipped with advanced features and capabilities to meet the demanding requirements of the industry. At the core of KOKUSAI CX3000 is its diffusion tube, which is made of high-purity quartz to ensure excellent thermal stability and uniform heating characteristics. The tube is designed to accommodate multiple wafers simultaneously, allowing for batch processing of wafers to increase throughput and efficiency. The diffusion tube is also equipped with specialized gas distribution systems to deliver precise control over the flow of dopant gases and other process gases, ensuring accurate and reproducible processing results. CX-3000 offers a wide range of operating temperatures, from low temperature processes for annealing and oxidation to high-temperature processes for diffusion and annealing. The equipment is equipped with multiple heating zones and precise temperature control mechanisms to create the ideal thermal profile for each process step. This ensures uniformity across the entire wafer surface and eliminates temperature variations that can affect device performance and yield. To further enhance the performance and reliability of the system, CX3000 is equipped with automated process control systems that monitor and adjust key parameters in real-time. This includes gas flow rates, temperature profiles, pressure levels, and other critical process variables to ensure optimal processing conditions and consistent results. KOKUSAI CX-3000 also offers a range of advanced process recipes and customization options to accommodate a variety of semiconductor processes and materials. Users can easily program and store customized recipes for different applications, allowing for quick and seamless process development and optimization. In addition to its advanced processing capabilities, KOKUSAI CX3000 is designed for ease of use and maintenance. The unit features a user-friendly interface with intuitive controls and data logging capabilities, allowing operators to monitor process parameters and performance metrics in real-time. The furnace is also equipped with diagnostic tools and remote monitoring capabilities to facilitate troubleshooting and maintenance activities. CX-3000 can be further enhanced with a range of accessories and upgrades to meet specific user requirements. This includes options for additional gas lines, wafer handling systems, and advanced process monitoring tools. The machine can also be integrated with other tools and equipment in a semiconductor manufacturing line to create a fully automated and seamless production environment. Overall, CX3000 offers a powerful and versatile solution for semiconductor processing applications, combining advanced technology, precision control, and ease of use to enable high-performance and reliable wafer processing. Whether used for research and development or high-volume production, this diffusion furnace provides the capabilities and flexibility needed to meet the evolving demands of the semiconductor industry.
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