Used KOKUSAI CX-3000 #293762981 for sale
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ID: 293762981
Wafer Size: 12"
Vintage: 2012
Diffusion furnace, 12"
P/N: DJ-1206VN
Process: ALD SIN
Main controller: CX3010 / CX3010B
Power supply: 208V, 1 Phase / 440 V, 3 Phase
2012 vintage.
KOKUSAI CX-3000 is a high-performance diffusion furnace designed to meet the growing demands of the semiconductor industry for advanced process technologies. This state-of-the-art equipment offers a range of capabilities that make it suitable for both research and production environments. At the core of KOKUSAI CX3000 is its advanced process control system, which ensures precise temperature control and uniformity throughout the chamber. This is critical for achieving consistent and repeatable results in diffusion processes, where even slight variations in temperature can impact device performance. The furnace chamber of CX-3000 is constructed from high-quality materials that can withstand the harsh process conditions required for diffusion processes. The chamber can reach temperatures of up to 1200 degrees Celsius, making it suitable for a wide range of diffusion processes, including phosphorus, boron, and arsenic dopant diffusion. One of the key features of CX3000 is its ability to support multiple process gases, allowing for a high degree of process flexibility. The unit is equipped with separate gas lines for different process gases, as well as precise flow controllers that ensure accurate gas delivery rates. This allows users to easily switch between different process recipes without the need for extensive reconfiguration. KOKUSAI CX-3000 also features a comprehensive safety machine that monitors critical process parameters and can automatically shut down the tool in the event of a fault or abnormal condition. This helps to protect both the asset and the operator from potential safety hazards, ensuring a high level of reliability and uptime. In addition to its advanced process control capabilities, KOKUSAI CX3000 also offers a range of accessories that further enhance its functionality. These include a load lock model for wafer transfer, a rapid cooling equipment for quick process turnaround, and a quartz tube cleaning system for easy maintenance. CX-3000 is designed to be user-friendly and easy to operate, with a intuitive touch screen interface that allows users to easily monitor and adjust process parameters. The unit also features remote monitoring and control capabilities, allowing users to access and control the machine from a remote location. Overall, CX3000 is a versatile and reliable diffusion furnace that offers the advanced process control and flexibility required for today's semiconductor industry. Its robust construction, advanced safety features, and range of accessories make it a valuable tool for research and production environments alike.
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