Used KOKUSAI CX-3000 #293762990 for sale

KOKUSAI CX-3000
ID: 293762990
Wafer Size: 12"
Vintage: 2005
Diffusion furnace, 12" P/N: DD-1223V Process: BIO Main controller: CX3010 / CX3010B Power supply: 208V, 1 Phase / 440 V, 3 Phase 2005 vintage.
KOKUSAI CX3000 is a highly advanced and versatile diffusion furnace that is designed to meet the demands of the semiconductor industry for precise and efficient thermal processing of silicon wafers. This cutting-edge equipment offers a wide range of features and capabilities that make it ideal for high-volume semiconductor manufacturing applications. At the heart of KOKUSAI CX-3000 is its robust and reliable diffusion chamber, which is capable of handling a large number of wafers simultaneously. The chamber is constructed from high-quality materials that are resistant to the harsh conditions of high-temperature thermal processing. This ensures that the wafers are subjected to uniform and controlled heat treatment for optimal diffusion performance. One of the key features of CX3000 is its advanced heating system, which consists of multiple heating elements that are strategically placed throughout the chamber. These heating elements can be individually controlled to provide precise and uniform heating profiles across the entire wafer surface. This enables the unit to accommodate a wide range of thermal processing parameters, including ramp-up and ramp-down rates, soak times, and peak temperatures. In addition to its advanced heating machine, CX-3000 also features a sophisticated gas delivery tool that is designed to provide precise control over the atmosphere within the diffusion chamber. This asset is capable of delivering a wide range of process gases, such as dopant gases and inert gases, at precisely controlled flow rates. This ensures that the wafers are exposed to the exact gas mixtures required for the diffusion process. KOKUSAI CX3000 is also equipped with a comprehensive temperature monitoring and control model that continuously monitors the temperature of the wafers during processing. This equipment utilizes highly accurate thermocouples and pyrometers to provide real-time feedback on the temperature profile of the wafers, allowing for on-the-fly adjustments to ensure consistent and reproducible results. To further enhance the performance and versatility of KOKUSAI CX-3000, a range of accessories and options are available. These include various wafer handling systems, such as automated wafer loaders and unloaders, as well as advanced process control software that allows for the customization of thermal processing recipes. Overall, CX3000 is a state-of-the-art diffusion furnace that offers unparalleled performance, reliability, and flexibility for semiconductor manufacturers. Whether used for high-volume production or research and development applications, this system is designed to deliver precise and consistent results for a wide range of thermal processing requirements. Its advanced features and capabilities make it an indispensable tool for any semiconductor fabrication facility looking to achieve the highest levels of wafer quality and process efficiency.
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