Used KOKUSAI CX-3000 #293763007 for sale

KOKUSAI CX-3000
ID: 293763007
Wafer Size: 12"
Vintage: 2003
Diffusion furnace, 12" Part number: DD-1223V Process: H2 Anneal Main controller: CX3010/CX3010B Power supply: 208 V, 1 Phase / 208 V, 3 Phase 2003 vintage.
KOKUSAI CX-3000 is a highly advanced and versatile diffusion furnace equipment designed for semiconductor manufacturing processes. This comprehensive tool is equipped with numerous accessories and features that enable precise control over the diffusion processes, ensuring high-quality results and improved productivity. KOKUSAI CX3000 is engineered by KOKUSAI, a leading provider of semiconductor equipment with a reputation for delivering cutting-edge solutions to the industry. At the core of CX-3000 system is the diffusion furnace, which plays a crucial role in the doping process of semiconductor materials. The furnace is designed to create a controlled atmosphere for the diffusion process, enabling dopant atoms to penetrate the surface of the semiconductor substrate and alter its electrical properties. CX3000 furnace is built with high-quality materials and advanced heating elements, ensuring uniform temperature distribution and stable operation throughout the diffusion cycle. One of the key strengths of KOKUSAI CX-3000 unit is its flexibility and scalability. The machine is capable of handling a wide range of wafer sizes, from small substrates to large-diameter wafers, making it suitable for various production requirements. In addition, the tool can be easily customized with different accessories and configurations to meet specific process needs, allowing semiconductor manufacturers to adapt the tool to their unique requirements. KOKUSAI CX3000 asset is equipped with advanced process control features that enhance the efficiency and repeatability of diffusion processes. The model utilizes precise temperature control mechanisms to maintain the desired thermal profile during the diffusion cycle, ensuring consistent and reliable results. Furthermore, the equipment is integrated with sophisticated gas flow control systems that enable precise dosing of dopant gases, minimizing waste and optimizing process efficiency. In addition to its advanced diffusion furnace, CX-3000 system comes with a range of accessories and peripherals that enhance its functionality and versatility. These accessories include loading and unloading mechanisms for wafer handling, gas delivery systems for dopant gases, monitoring and control systems for process parameters, as well as data logging and analysis tools for process optimization. The unit is also compatible with advanced automation and recipe management software, allowing for seamless integration with other manufacturing equipment. CX3000 machine is designed with a focus on user-friendly operation and maintenance. The tool features an intuitive interface that enables operators to monitor and control the diffusion processes with ease. The asset also incorporates advanced diagnostic tools that help identify and address potential issues, minimizing downtime and optimizing model performance. Additionally, the equipment is built with robust and durable components that ensure long-term reliability and minimal maintenance requirements. In conclusion, KOKUSAI CX-3000 diffusion furnace system is a state-of-the-art tool that offers unmatched performance, reliability, and flexibility for semiconductor manufacturing processes. With its advanced features, accessories, and user-friendly design, KOKUSAI CX3000 unit is well-suited for meeting the demanding requirements of modern semiconductor production facilities.
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