Used KOKUSAI CX-3000 #293763012 for sale

KOKUSAI CX-3000
ID: 293763012
Wafer Size: 12"
Vintage: 2003
Diffusion furnace, 12" Part number: DJ-1223VN -DF Process: SI3N4 Main controller: CX3010 / CX3010B Power supply: 208 V, Single phase / 440 V, 3 Phase 2003 vintage.
KOKUSAI CX-3000 is a state-of-the-art diffusion furnace designed for high-temperature processing of semiconductor materials. This versatile equipment is equipped with a range of accessories and capabilities to meet the demanding requirements of the semiconductor industry. The diffusion furnace features a horizontal configuration with multiple heating zones, allowing for precise control of the temperature profile across the processing chamber. The heating elements consist of high-quality resistance wires or graphite rods, which ensure uniform and stable heat distribution throughout the furnace. One of the key aspects of KOKUSAI CX3000 is its advanced gas delivery system, which allows for precise control of process gases such as dopants and oxidants. The unit is equipped with mass flow controllers and gas distribution manifolds to ensure accurate and reproducible gas flow rates during the diffusion process. CX-3000 also features a sophisticated control machine that allows for real-time monitoring and adjustment of process parameters. The tool is equipped with a user-friendly interface that provides operators with easy access to setpoints, alarms, and data logging functions. In addition to the diffusion furnace itself, CX3000 comes with a range of accessories to enhance its capabilities. These include: 1. Load-lock chamber: The load-lock chamber allows for quick and efficient loading and unloading of wafers into the main processing chamber, minimizing downtime and increasing throughput. 2. Gas handling asset: The gas handling model includes gas cylinders, regulators, and delivery lines to ensure a reliable and continuous supply of process gases to the diffusion furnace. 3. Wafer handling equipment: The wafer handling system consists of robotic arms or wafer boats that transport wafers from the load-lock chamber to the processing chamber and back, ensuring precise positioning and handling of the wafers. 4. Vacuum unit: The vacuum machine is essential for creating the low-pressure environment required for certain diffusion processes. KOKUSAI CX-3000 is equipped with a high-performance vacuum pump and pressure sensors to maintain the desired vacuum level. 5. Temperature monitoring tool: The temperature monitoring asset includes thermocouples and infrared sensors that provide real-time feedback on the temperature profile inside the processing chamber, allowing for precise control of the thermal processing conditions. Overall, KOKUSAI CX3000 is a powerful and reliable diffusion furnace model that offers unparalleled performance and flexibility for a wide range of semiconductor processing applications. With its advanced features and accessories, this equipment is well-suited for research and production facilities looking to achieve precise and reproducible diffusion processes for semiconductor device manufacturing.
There are no reviews yet