Used KOKUSAI CX-3000 #293763013 for sale

KOKUSAI CX-3000
ID: 293763013
Wafer Size: 12"
Vintage: 2015
Diffusion furnace, 12" Part number: DJ-1206VN-DM Process: ALD SIN Main controller: CX3010 / CX3010B Power supply: 208 V, Single phase / 440 V, 3 Phase 2015 vintage.
KOKUSAI CX-3000 is a state-of-the-art diffusion furnace designed for high-temperature processing of semiconductor materials in a controlled atmosphere. This versatile tool offers precise temperature control, uniform heating distribution, and a variety of accessories to meet the demands of advanced semiconductor manufacturing processes. At the heart of KOKUSAI CX3000 is a robust vertical furnace chamber equipped with multiple heating zones and gas distribution channels. The furnace chamber is enclosed in a temperature-controlled environment to ensure stable operation even at extreme temperatures. The heating elements are made of high-quality materials that can withstand prolonged exposure to harsh process conditions without compromising performance. CX-3000 is capable of reaching temperatures up to 1200°C, making it suitable for a wide range of diffusion processes, including oxidation, annealing, and doping. The precise temperature control system allows users to program and monitor the temperature profile during the entire process, ensuring reproducibility and consistency in wafer processing. To enhance the performance and flexibility of CX3000, a variety of accessories are available, including gas flow controllers, vacuum pumps, and wafer loading systems. Gas flow controllers regulate the flow of process gases into the chamber, enabling precise control over the process atmosphere and the reaction kinetics. Vacuum pumps are used to create a low-pressure environment inside the chamber, essential for certain processes requiring reduced oxygen levels or improved film quality. The wafer loading system allows for efficient loading and unloading of wafers into the furnace chamber, minimizing downtime and improving productivity. The system features a user-friendly interface that allows operators to easily load and unload multiple wafers simultaneously, reducing the risk of contamination and ensuring uniform processing across all wafers. In addition to its advanced technical capabilities, KOKUSAI CX-3000 is designed with user convenience and safety in mind. The furnace chamber is equipped with multiple safety features, including overheat protection, gas leak detection, and emergency stop buttons to prevent accidents and ensure operator safety during operation. Overall, KOKUSAI CX3000 diffusion furnace and its accessories offer a comprehensive solution for advanced semiconductor processing needs. With its high-temperature capabilities, precise control systems, and versatile accessories, CX-3000 is a versatile tool for research and development laboratories, semiconductor manufacturing facilities, and other industries requiring precise and reliable diffusion processes.
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