Used KOKUSAI CX-3000 #293763027 for sale
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ID: 293763027
Wafer Size: 12"
Vintage: 2006
Diffusion furnace, 12"
Part number: DJ-1206VN-DM
Process: Nitride
Power supply: 120 V, Single phase / 480 V, 3 Phase
2006 vintage.
KOKUSAI CX-3000 is a state-of-the-art diffusion furnace designed for advanced semiconductor manufacturing processes in the field of microelectronics. This high-performance equipment offers precise control over gas flow, temperature uniformity, and processing time, making it ideal for a wide range of applications that require consistent and reliable diffusion processes. KOKUSAI CX3000 features a robust design that ensures maximum process stability and repeatability, essential for achieving high-quality results in semiconductor fabrication. The system is equipped with multiple heating zones, each independently controlled to provide excellent temperature uniformity across the wafer surface. This uniform heating profile is essential for achieving consistent doping and annealing processes, critical for the performance and reliability of semiconductor devices. One of the key features of CX-3000 is its advanced gas delivery unit, which allows for precise control over the flow rates and ratios of dopant gases. This level of control ensures accurate doping profiles and minimizes process variations, resulting in highly uniform device characteristics. The machine is also capable of handling a wide range of process gases, making it versatile for different types of diffusion processes. In addition to its gas delivery capabilities, CX3000 is equipped with an advanced vacuum tool that ensures a clean and stable processing environment. The asset is designed to maintain high vacuum levels throughout the process, minimizing contamination and impurities that can adversely affect device performance. This feature is particularly important for achieving high yields and reliability in semiconductor manufacturing. KOKUSAI CX-3000 is also designed for ease of operation and maintenance, with a user-friendly interface that allows for precise process parameter control. The model includes built-in diagnostics and monitoring features that provide real-time feedback on process performance, enabling operators to quickly identify and address any issues that may arise during processing. Additionally, the equipment incorporates safety features to prevent potential hazards and ensure operator safety during operation. KOKUSAI CX3000 can be seamlessly integrated into a production line or research environment, offering flexibility and scalability to meet the evolving needs of semiconductor manufacturing. The system is designed to accommodate a wide range of wafer sizes and types, making it suitable for various applications, from research and development to high-volume production. Overall, CX-3000 diffusion furnace is a reliable and versatile unit that offers precise control, high performance, and operational efficiency for advanced semiconductor manufacturing processes. With its advanced features and capabilities, CX3000 is an excellent choice for semiconductor manufacturers looking to achieve superior device performance and reliability in their production processes.
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