Used KOKUSAI CX-3000 #293763105 for sale

KOKUSAI CX-3000 is a state-of-the-art diffusion furnace designed to achieve precise and uniform thermal processing for semiconductor manufacturing applications. This advanced equipment is equipped with innovative features and accessories that enable high-performance wafer processing with exceptional reliability and control. KOKUSAI CX3000 is a horizontal batch furnace that utilizes a quartz tube as the process chamber to accommodate multiple wafers simultaneously. The system is built with a robust design and high-quality materials to ensure durability and long-term performance. The furnace is capable of reaching temperatures up to 1200°C, providing a wide range of thermal processing options for various semiconductor fabrication processes. One of the key features of CX-3000 is its advanced temperature control unit, which allows for precise and uniform heating of the wafers within the process chamber. The machine is equipped with multiple heating zones and individual temperature controllers to achieve tight temperature uniformity across the wafer surface. This ensures consistent processing results and minimizes variations in film thickness and electrical properties. CX3000 also features a sophisticated gas delivery tool that enables precise control of the process atmosphere during thermal processing. The asset is equipped with mass flow controllers and gas mixing capabilities to create custom gas mixtures tailored to specific process requirements. This allows for accurate control of the dopant diffusion process and the formation of advanced thin films with high-quality characteristics. In addition to its advanced temperature and gas control capabilities, KOKUSAI CX-3000 is equipped with a comprehensive automation model that enables seamless operation and process monitoring. The equipment is integrated with a user-friendly interface that allows for easy programming of thermal profiles and recipes for different process steps. Real-time monitoring and data logging features provide operators with the necessary feedback to optimize process parameters and ensure consistent results. To enhance the versatility and compatibility of KOKUSAI CX3000, a range of accessories and customization options are available to meet specific customer requirements. The system can be configured with additional process chambers, wafer handling systems, and gas purifiers to support a variety of wafer sizes and processing needs. Customized configurations can be tailored to meet specific process requirements and accommodate future technology advancements. Overall, CX-3000 diffusion furnace is a cutting-edge solution for semiconductor manufacturing applications that demand high precision and reliability. With its advanced thermal processing capabilities, precise temperature and gas control, and user-friendly automation features, CX3000 is a versatile and efficient unit for achieving high-quality wafer processing results. Its robust design, innovative features, and customizable options make it an ideal choice for semiconductor fabs looking to optimize their production processes and achieve consistent and reliable device performance.