Used KOKUSAI CX-3000 #293763113 for sale
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ID: 293763113
Wafer Size: 8"
Diffusion furnace, 8"
Part number: DJ-835V 8BL
Main controller: CX3001
Process: SI3N4
Power supply: 120 V, Single phase / 208 V, 3 Phase.
KOKUSAI CX-3000 is a state-of-the-art diffusion furnace equipment designed for high-performance semiconductor manufacturing processes. This advanced tool offers precise control over the thermal diffusion process, enabling the production of high-quality semiconductor devices with superior performance characteristics. The system is equipped with advanced features and capabilities that make it an ideal choice for semiconductor fabrication facilities looking to achieve optimal results in their manufacturing operations. KOKUSAI CX3000 diffusion furnace is built with a robust design that ensures reliable and consistent performance in a production environment. The unit is equipped with multiple heating zones, allowing for precise control over the temperature profile during the diffusion process. This advanced temperature control capability enables the machine to achieve uniform and repeatable thermal processing, leading to consistent device performance and high yield rates. One key feature of CX-3000 diffusion furnace is its high throughput capability, which allows for the processing of a large number of wafers in a single batch. This high throughput capability is essential for semiconductor manufacturing facilities looking to maximize their production efficiency and meet the demands of the rapidly evolving semiconductor market. The tool is also equipped with automatic loading and unloading mechanisms, further enhancing its productivity and ease of use. In addition to its high throughput capability, CX3000 diffusion furnace offers a wide range of process recipes and customization options to accommodate various semiconductor manufacturing requirements. The asset is capable of supporting multiple types of diffusion processes, including standard doping, drive-in, and annealing processes, allowing for flexibility in process development and optimization. Furthermore, the model is equipped with advanced process monitoring and control features that enable real-time adjustments to the process parameters, ensuring precise and consistent processing results. Moreover, KOKUSAI CX-3000 diffusion furnace is designed with a user-friendly interface that provides operators with easy access to equipment controls and monitoring tools. The system is equipped with a intuitive graphical user interface that allows for quick setup and configuration of process recipes, as well as real-time monitoring of process parameters and data logging. This user-friendly interface helps operators streamline their workflow and reduce the risk of human error during the manufacturing process. In conclusion, KOKUSAI CX3000 diffusion furnace is a cutting-edge semiconductor manufacturing tool that offers advanced features and capabilities for high-performance device fabrication. With its high throughput capability, precise temperature control, versatile process recipes, and user-friendly interface, the unit is an ideal choice for semiconductor fabrication facilities looking to achieve superior results in their manufacturing operations. CX-3000 diffusion furnace sets a new standard for diffusion furnace technology, enabling semiconductor manufacturers to meet the demands of the ever-evolving semiconductor market with confidence and efficiency.
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