Used KOKUSAI CX-5000 #293762571 for sale

KOKUSAI CX-5000 is a diffusion furnace and accessories used for diffusion processes in semiconductor device fabrication. It features a high-temperature design and offers excellent performance for a variety of diffusion processes, including boron, phosphorus, and arsenic doping. It is adaptable to four-inch, six-inch, and eight-inch wafer sizes and features a 250mm quartz processing tube design for uniform temperatures. This diffusion equipment is equipped with a Nikon microscope for viewing the wafers while they are in the furnace, allowing for quick visual inspection. CX-5000 has three individual process zones: the preheat zone, the diffusion zone, and the cooling zone. The preheat zone is designed with a strong heater to uniformly heat the wafer before it enters the diffusion zone, and is independent of the diffusion zone, allowing it to be operated at lower temperatures than the diffusion zone. This design ensures that temperatures are uniform throughout the wafer while it is in the preheat zone and prevents heat gradients from forming after entering the diffusion zone. The diffusion zone has a high-temperature design with stable temperatures for accurate diffusion processes throughout the system. The high-temperature design operates at temperatures between 800 and 1150 degrees Celsius, allowing for boron, phosphorus, and arsenic dopant diffusion processing. The diffusion zone also includes an automatic sample chamber wiper for efficient cleaning. KOKUSAI CX-5000 diffusion furnace is also equipped with a built-in gas supply tank, vacuum pump, and gas monitor for increased process control and safety. The cooling zone of CX-5000 diffusion furnace offers an efficient and rapid cooling process. It is equipped with a two-stage cooling unit that operates at a maximum cooling rate of 50 degrees Celsius per minute. The cooling zone prevents wafer cracking during the cooling process and offers increased machine performance. KOKUSAI CX-5000 diffuser also includes a host of additional features that increase accuracy and performance, such as a E-scope that continuously monitors the temperature of each sample, a max-power monitor with alarm output, and a fan-type cooling tool to reduce heating of the equipment during extended diffusion processes. CX-5000 is the perfect choice for high-temperature diffusion processes due to its high temperature and excellent performance. With its advanced features and capabilities, this diffusion furnace is the ideal choice for various silicon device fabrication processes.