Used KOKUSAI CX-5000 #293762574 for sale

KOKUSAI CX-5000
ID: 293762574
Wafer Size: 12"
Vintage: 2011
Diffusion furnace, 12" Part number: DJ-1206VN-DF Process: TiN Main controller: KDSC Power supply: 120 V, 1 Phase / 480 V, 3 Phase 2011 vintage.
KOKUSAI CX-5000 is a diffusion furnace and accessories designed for advanced thermal processing, including diffusion. This furnace equipment is ideal for applications such as silicon deposition and siliconized epitaxy. CX-5000 features all-transition metal hot-wall thermal processing capabilities and is capable of completing high-throughput processes with tight temperature and time control. The heart of KOKUSAI CX-5000 is its vertical quartz hot-wall furnace. This furnace features an electromagnetically-controlled IR radiant heater, allowing precise temperature and process control. The platform is designed for maximum process throughput, with a fast thermal cycle time and temperature uniformity reaching up to 1-2°C across the wafer. CX-5000 is designed for flexibility and can be easily customized to accommodate any type of diffusion process or layer transfer. Five types of silicon substrate can be used for diffusion and the system also comes with an integrated gas injector unit for gas doping and CVD. A highly efficient and user-friendly software suite is included with the kit. This allows researchers to program and monitor the machine remotely, eliminating the need for manual control and observation. KOKUSAI CX-5000 is fully compatible with JGRC's EXPERT tool (Experimental Pattern Routing Asset), allowing users to send an experimental design to the furnace for automatic execution. CX-5000 features a variety of other safety and convenience features for advanced thermal processing, including automated self-diagnostics, EMI and RoHS certified components, and a built-in thermal cut-off. Overall, KOKUSAI CX-5000 is a state-of-the-art diffusion furnace and accessories, designed for optimal accuracy and reliability for advanced thermal processing. It is ideal for those requiring precise temperature and time control, as well as users wanting to maximize process throughput and flexibility.
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