Used KOKUSAI CX-5000 #293762977 for sale

KOKUSAI CX-5000
ID: 293762977
Wafer Size: 12"
Vintage: 2008
Diffusion furnace, 12" Part number: DJ-1206VN -DF Process: HTO Main controller: KDSC Power supply: 120 V, 1 Phase / 480 V, 3 Phase 2008 vintage.
KOKUSAI CX-5000 Diffusion Furnace is an advanced precision instrument designed to allow precise control and automation of a wide range of diffusion processes in high-performance semiconductor fabrication. It features fully automatic powder filling and an integrated CVD chamber. This single-chamber furnace is constructed to provide more precise temperature control and homogeneous processing. CX-5000 features an adjustable high-temperature zone and advanced forced-air cooling setup for the safe removal of powder. The optimized temperature range for processing is approximately 815°C-1150°C, and can be adjusted to provide precise substrate temperatures. KOKUSAI CX-5000 is designed with a variety of controls and settings to accommodate precise settings for specialized processing requirements. Receiving commands from an external computer, CX-5000 comes with an automation enabled Multi-Step program (MS mode), along with other preprogrammable process options. KOKUSAI CX-5000 also comes with an accurate quartz-heat-sensor and an automatic self-correction function via PID control, allowing for stable and precise temperature control. The furnace includes multi-zone capabilities, providing accurate uniformity even with large-sized substrates. CX-5000 also features an Activated Gas Pressure Control system which guarantees a reliable and safe process and result. The temperature control of the various furnaces can be checked remotely via an Ethernet connection, providing software support and integration services.KOKUSAI CX-5000 also comes with a high-performance filtration system and advanced alarm and interlock functions. CX-5000 Diffusion Furnace is an advanced and reliable system, providing precise and uniform diffusion processing. Its high temperature and automation capabilities are perfect for a variety of high-performance semiconductor fabrication and processing applications.
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