Used KOKUSAI CX-5000 #293762979 for sale

KOKUSAI CX-5000
ID: 293762979
Wafer Size: 12"
Vintage: 2007
Diffusion furnace, 12" Part number: DJ-1206VN -DF Process: SI3N4 Main controller: KDSC Power supply: 120 V, 1 Phase / 480 V, 3 Phase 2007 vintage.
KOKUSAI CX-5000 is a versatile and efficient diffusion furnace used for a wide range of applications related to the fabrication of semiconductor devices, including thermal oxidation, annealing, and diffusion processes. It can support up to three-dimensional substrates including various wafers, SOI, and glass substrates. The furnace is build for flexibility and superior process performance. It is equipped with both rapid thermal oxidation (RTO) and rapid thermal annealing (RTA). The RTO allows for oxidation of the surface layers of wafers while the RTA is able to anneal thermally fragile substrates. Both processes provide excellent uniformity in substrate temperature and workpiece temperature. CX-5000 utilizes a triple chamber/dual-zone design. This provides separate temperature zones for individual components as well as optimum control. Advanced gas flow models are used to ensure uniformity and uniformity of the gas that enters the reaction chamber. The three chambers are housed in an airtight enclosure that is able to maintain a positive pressure and ensures high-purity process gases. The temperature control equipment consists of a servo-driven mechanism that has an array of sensors that measure and control parameters such as temperature, pressure, and oxygen concentration. A wide range of accessories are available for KOKUSAI CX-5000, including pre-heat zone (PHZ) modules, profile monitor modules, multi-spin modules, and advanced exhaust systems. Pre-heat zones are necessary for ensuring uniform temperature distribution in the processing chamber. Profile monitors are used to measure the temperature profile during oxidation and diffusion. Multi-spin modules allow for higher loading of the chamber with multiple wafers. The advanced exhaust systems are designed to maintain a high degree of purity in the chamber atmosphere and the exhaust stream. The advanced control system of CX-5000 provides precise and reliable control of key parameters such as temperature, pressure, and oxygen concentration, ensuring superior and repeatable process results. It can be interfaced with computers to allow for controlling the process remotely and for remote data collection. The unit also includes safety features such as temperature overshoot detection and pressure control. Overall, KOKUSAI CX-5000 is an advanced and efficient diffusion furnace with excellent uniformity and process reliability. It is built with a wide range of accessories to provide a truly versatile and superior machine for a variety of diffusion processes. In addition, CX-5000 diffusion furnace is designed for easy operation and maintenance. It is simple to calibrate and commission, and its modular design ensures that maintenance is straightforward. The design also makes it easy to upgrade hardware components or to add additional features as required.
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