Used KOKUSAI CX-5000 #293762985 for sale

KOKUSAI CX-5000
ID: 293762985
Wafer Size: 12"
Vintage: 2007
Diffusion furnace, 12" Part number: DJ-1206VN -DF Process: SI3N4 Main controller: KDSC Power supply: 120 V, 1 Phase / 480 V, 3 Phase 2007 vintage.
KOKUSAI CX-5000 is a diffusion furnace and accessory equipment designed for efficient processing of integrated circuits and thin film devices. The system offers high temperatures, fast heating and cooling rates, and a number of features that make it ideal for fabricating high-quality, reliable devices. CX-5000 diffusion furnace is designed to provide uniform temperature control over a wide temperature range of 0 to 1,400°C. A top-loading loader permits easy substrate insertion and removal. The loader has a maximum substrate size of 4-inch and a thermal cycling time of 1-5000 seconds. The temperature set point accuracy of the heater is ±2°C. KOKUSAI CX-5000 diffusion furnace is equipped with a temperature controller and a highly efficient PID control algorithm. This unit helps maintain precise temperature management during annealing and diffusion processes. The machine also offers auto-shutdown and over-temperature protection to prevent damage to the components. CX-5000 diffusion furnace is powered by a 120V or 220V single phase power connection. This reliable power connection allows continuous operations over long periods of time. The power leakage is less than two milliamperes, which makes it very safe to operate multiple systems connected to the same power line. The power efficiency rating for KOKUSAI CX-5000 is greater than 70 percent. CX-5000 diffusion furnace tool also includes a number of accessories, such as an automated load/unload mechanism, a hot wall enclosure, and a conformal cooling feature that helps reduce thermal shock caused by abrupt changes in temperature. The asset also features an integrated gas distribution model that allows for precise gas delivery to the process chamber. KOKUSAI CX-5000 diffusion furnace is built with durable materials, ensuring reliable performance and multiple uses. The equipment is designed for high-temperature annealing and diffusion applications, making it ideal for use in semiconductor device manufacturing. Additionally, CX-5000 diffusion furnace system can be used for research and development activities, such as annealing thin film devices or test samples for new products.
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