Used KOKUSAI CX-5000 #293762987 for sale
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ID: 293762987
Wafer Size: 12"
Diffusion furnace, 12"
Part number: DJ-1206VN -DF
Process: SI3N4
Main controller: KDSC
Power supply: 120 V, 1 Phase / 480 V, 3 Phase.
KOKUSAI CX-5000 is a state-of-the-art diffusion furnace equipment tailored for the precise thermal processing of semiconductor materials. This high-performance tool is designed to meet the demanding requirements of semiconductor manufacturing, research, and development applications. With its advanced features and exceptional performance capabilities, CX-5000 facilitates reliable and reproducible thermal processing for a wide range of materials and process needs. The furnace chamber of KOKUSAI CX-5000 is designed to accommodate various substrate sizes, making it versatile and adaptable to different processing requirements. The system is equipped with precise temperature control mechanisms that ensure uniform heating and cooling across the entire substrate surface. This uniformity is crucial for achieving consistent and high-quality results in semiconductor processing. CX-5000 features a robust gas delivery unit that enables precise control of the process atmosphere within the furnace chamber. The machine is capable of delivering a variety of process gases with high accuracy and repeatability, allowing users to tailor the process environment to the specific requirements of their applications. This flexibility makes KOKUSAI CX-5000 suitable for a wide range of processes, such as oxidation, diffusion, and annealing. One of the key strengths of CX-5000 is its advanced process monitoring and control capabilities. The tool is equipped with a sophisticated control asset that allows users to monitor and adjust key process parameters in real time. This level of control ensures the precise execution of thermal processes and enables users to achieve the desired outcomes consistently. Additionally, KOKUSAI CX-5000 is equipped with comprehensive safety features to protect both the model and the operators during operation. CX-5000 is designed to be highly reliable and easy to maintain, minimizing downtime and ensuring continuous operation. The equipment is constructed from high-quality materials and components that are engineered for long-term durability and performance. Routine maintenance tasks are straightforward and can be performed efficiently, enabling users to keep the system in optimal condition with minimal effort. In addition to the furnace chamber, KOKUSAI CX-5000 is available with a range of accessories and optional features that further enhance its performance and versatility. These accessories may include advanced wafer handling systems, additional gas delivery options, and custom process recipes tailored to specific applications. By customizing the unit with these accessories, users can optimize CX-5000 for their unique processing needs. Overall, KOKUSAI CX-5000 is a cutting-edge diffusion furnace machine that offers exceptional performance, reliability, and flexibility for semiconductor processing applications. With its advanced features and capabilities, CX-5000 is well-suited for use in both research and development environments and high-volume manufacturing settings. Whether processing silicon wafers, compound semiconductors, or other materials, KOKUSAI CX-5000 provides a robust and versatile platform for achieving precise and repeatable thermal processing results.
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