Used KOKUSAI CX-5000 #293763029 for sale

KOKUSAI CX-5000 is a state-of-the-art diffusion furnace designed for the precise, uniform, and efficient diffusion of dopants into silicon substrates for semiconductor manufacturing. This advanced furnace is equipped with a range of features and accessories that facilitate high-temperature thermal processing with exceptional control and reliability. At the heart of CX-5000 is a high-performance quartz tube furnace, which provides a stable and homogeneous thermal environment for dopant diffusion processes. The furnace is capable of reaching temperatures up to 1200°C, allowing for the precise control of dopant activation and diffusion profiles in the silicon substrate. The quartz tube is designed to resist thermal shock and chemical attacks, ensuring long-term performance and reliability. KOKUSAI CX-5000 is equipped with a sophisticated temperature control equipment that allows users to program and monitor the furnace temperature with high precision. The temperature uniformity across the furnace tube is maintained within tight tolerances, ensuring consistent and reproducible diffusion results. The furnace also features rapid heating and cooling capabilities, enabling fast process cycles and high throughput in semiconductor manufacturing. To enhance the diffusion process, CX-5000 is equipped with a range of gas delivery and mixing systems that allow for the precise control of dopant gases and carrier gases. The system is capable of handling a variety of dopant species, including phosphorous, boron, and arsenic, with high purity and stability. The gas flow rates and mixing ratios can be easily adjusted to optimize the doping conditions for specific semiconductor device applications. In addition to the core furnace unit, KOKUSAI CX-5000 comes with a comprehensive set of accessories and options that further enhance its performance and versatility. These accessories include a load lock machine for automated wafer loading and unloading, a vacuum pump tool for precise pressure control, and a range of process monitoring and control tools for real-time analysis of the diffusion process. One of the key advantages of CX-5000 is its advanced process control and automation capabilities. The furnace is compatible with industry-standard process control software, allowing for seamless integration into semiconductor manufacturing workflows. The asset can be easily configured for batch processing or single-wafer processing, depending on the specific requirements of the application. Overall, KOKUSAI CX-5000 represents a cutting-edge solution for dopant diffusion in semiconductor manufacturing, offering exceptional performance, reliability, and versatility. With its advanced features and accessories, this diffusion furnace provides semiconductor manufacturers with the tools they need to achieve precise and uniform doping profiles for a wide range of semiconductor devices.