Used KOKUSAI CX-5000 #293763030 for sale

KOKUSAI CX-5000
ID: 293763030
Wafer Size: 12"
Vintage: 2015
Diffusion furnace, 12" Part number: DJ-1236VN -DF Process: ALD Power supply: 120 V, Single phase / 480 V, 3 Phase 2015 vintage.
KOKUSAI CX-5000 is a state-of-the-art diffusion furnace equipment designed for high-performance semiconductor manufacturing processes. This advanced tool offers precise control over temperature, atmosphere, and ramp rates, making it ideal for a wide range of diffusion processes such as oxidation, annealing, and doping. CX-5000 is a versatile platform that can accommodate various sizes of substrates and is equipped with advanced features to ensure consistent and reliable results. One of the key features of KOKUSAI CX-5000 is its multi-zone heating system, which allows for uniform temperature distribution across the wafer surface. This is critical for achieving high-quality, repeatable diffusion results. The unit is equipped with high-performance heating elements and a sophisticated temperature control machine that can accurately maintain the desired process temperature within a tight tolerance range. In addition to temperature control, CX-5000 offers precise control over the process atmosphere. The tool is capable of creating a wide range of gas mixtures, including oxygen, nitrogen, argon, and hydrogen, to suit different process requirements. The gas flow rates and composition can be easily adjusted using the intuitive control interface, allowing for flexibility in process development and optimization. KOKUSAI CX-5000 also features a rapid ramp rate capability, allowing for quick temperature transitions during the diffusion process. This is essential for reducing process cycle times and increasing throughput in semiconductor fabrication facilities. The asset can achieve ramp rates of up to X degrees Celsius per second, ensuring efficient process execution without compromising on quality. In terms of wafer handling, CX-5000 is designed for maximum flexibility and ease of use. The model can accommodate various sizes of substrates, from small wafers to larger panels, and offers customizable loading configurations to meet specific application requirements. The wafer loading and unloading process is automated to minimize operator intervention and reduce the risk of contamination. To ensure process repeatability and reliability, KOKUSAI CX-5000 is equipped with advanced process monitoring and control features. The equipment can collect real-time data on temperature, gas flow, and other process parameters, allowing for precise process optimization and troubleshooting. The integrated process control software enables users to create and save process recipes, ensuring consistency across multiple runs. Maintenance of CX-5000 is straightforward and cost-effective, thanks to its modular design and easy access to critical components. The system is built with high-quality materials and components to ensure long-term reliability and performance. In the event of a malfunction, the user-friendly interface provides detailed diagnostics and troubleshooting information to quickly identify and address issues. Overall, KOKUSAI CX-5000 is a cutting-edge diffusion furnace unit that offers unmatched performance, versatility, and reliability for semiconductor manufacturing applications. With its advanced features and user-friendly design, CX-5000 is an essential tool for producing high-quality semiconductor devices with tight process control requirements.
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