Used KOKUSAI CX-5000 #293763031 for sale

KOKUSAI CX-5000
ID: 293763031
Wafer Size: 12"
Vintage: 2015
Diffusion furnace, 12" Part number: DJ-1236VN -DF Process: ALD Power supply: 120 V, Single phase / 480 V, 3 Phase 2015 vintage.
KOKUSAI CX-5000 is a highly advanced diffusion furnace equipment designed for the precise and efficient thermal processing of semiconductor materials in the manufacturing of integrated circuits and other electronic devices. This versatile system is equipped with a range of innovative features and accessories that enable it to deliver superior performance, reliability, and flexibility in a wide variety of applications. The heart of CX-5000 unit is its high-performance furnace chamber, which is designed to provide uniform and controlled heating of semiconductor wafers to temperatures of up to 1200°C. This furnace chamber is constructed from high-quality materials with excellent thermal properties to ensure maximum heat transfer efficiency and temperature uniformity across the wafer surface. The furnace is equipped with multiple heating zones and gas injection ports to enable precise temperature profiling and control during the wafer processing steps. To facilitate the diffusion process, KOKUSAI CX-5000 machine is equipped with advanced gas delivery and mixing systems that allow for the precise control of the ambient gas atmosphere inside the furnace chamber. This ensures that the semiconductor materials undergo the desired chemical reactions and diffusion processes at optimal temperatures and gas compositions for the best possible performance and yield. The tool is also capable of handling various process gases, such as oxygen, nitrogen, hydrogen, and dopant gases, depending on the specific requirements of the semiconductor processing steps. In addition to its core furnace chamber, CX-5000 asset is equipped with a range of innovative accessories and features that enhance its functionality and performance. These include a sophisticated process control model with advanced software algorithms that enable the precise programming and monitoring of the thermal processing steps. The equipment also features a comprehensive safety interlock system and alarms to ensure the protection of operators and equipment during operation. KOKUSAI CX-5000 unit also offers a high level of automation and integration capabilities, allowing for seamless connectivity with other semiconductor manufacturing equipment and process control systems. This enables the machine to operate in a fully automated production environment, ensuring maximum throughput and efficiency in high-volume manufacturing applications. The tool is also equipped with a user-friendly interface for easy operation and maintenance, allowing operators to quickly set up and run complex process recipes with minimal training and effort. Overall, CX-5000 diffusion furnace asset is a state-of-the-art solution for the thermal processing of semiconductor materials in advanced semiconductor manufacturing processes. With its high-performance furnace chamber, advanced gas delivery systems, and innovative features and accessories, the model offers unmatched performance, reliability, and flexibility for a wide range of applications in the semiconductor industry. Whether it is used for diffusion, oxidation, annealing, or other thermal processing steps, KOKUSAI CX-5000 equipment delivers exceptional results and ensures the highest quality and yield in semiconductor production.
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