Used KOKUSAI CX-5000 #293763035 for sale

KOKUSAI CX-5000 is a state-of-the-art diffusion furnace equipment designed for ultra-high temperature processing in semiconductor manufacturing applications. This advanced furnace offers precise control over temperature and atmosphere to ensure optimal diffusion of dopants into the silicon wafer substrate. In addition to the main diffusion furnace unit, CX-5000 is complemented by a range of accessories and peripherals that enhance its functionality and performance. The main furnace chamber of KOKUSAI CX-5000 is constructed of high-purity quartz tubing with a robust heating element system that provides uniform and stable temperature control. The unit is equipped with advanced gas delivery and mixing systems to create precise process atmospheres required for the diffusion process. The diffusion furnace can reach temperatures up to 1200 degrees Celsius, making it suitable for a wide range of diffusion processes including arsenic, phosphorus, and boron doping. One of the key features of CX-5000 is its advanced temperature control machine, which utilizes multiple thermocouples and a sophisticated PID control algorithm to maintain highly accurate temperature profiles across the wafer surface. This temperature uniformity ensures consistent and reliable diffusion results, critical for achieving tight process control in semiconductor manufacturing. To enhance the functionality of KOKUSAI CX-5000, a range of accessories and peripherals are available including a rapid thermal annealing (RTA) module, vacuum transfer chamber, and wafer handling tool. The RTA module enables rapid heating and cooling of wafers for annealing processes, while the vacuum transfer chamber allows for seamless transfer of wafers between process modules to minimize contamination and reduce downtime. The wafer handling asset of CX-5000 is designed for high throughput manufacturing, with options for single or multiple wafer processing to meet the demands of semiconductor production facilities. The model incorporates intelligent wafer mapping and tracking capabilities to ensure accurate positioning and alignment during processing, further enhancing process repeatability and yield. In addition to hardware components, KOKUSAI CX-5000 is supported by a comprehensive software package that provides intuitive process programming and control interfaces. The software allows users to create and edit process recipes, monitor real-time process parameters, and generate detailed reports for process analysis and optimization. Overall, CX-5000 diffusion furnace equipment offers a combination of advanced technology, precision control, and versatile accessories that make it a reliable and efficient solution for semiconductor diffusion processes. With its high temperature capabilities, temperature uniformity, and comprehensive automation features, KOKUSAI CX-5000 is ideally suited for high-volume semiconductor manufacturing environments requiring superior process performance and yield.