Used KOKUSAI CX3000 #9291189 for sale

KOKUSAI CX3000 is an advanced diffusion furnace and accessory that has been specifically designed for processing semiconductors. It is ideal for a wide variety of applications including power device materials, deposition of thin films, deposition of passivation layers, metallization, oxidation, annealing, doping and other special process applications. KOKUSAI CX-3000 provides unparalleled diffusion speed and uniformity due to its high-performance pair of external linear zone heaters, allowing for high productivity and uniformity. CX3000 has two independent heating units on four different levels, with up to three zones per unit, with an overall hot zone length of about 50 mm. CX-3000 also has a computerized process control system, allowing for precise control of time, temperature, and gas flows. The advanced KOKUSAI CX3000 has multi-layered diffusion chamber walls, which provide excellent heat insulation for faster, uniform heat transfer and gentle temperature ramping, which is crucial for protecting delicate substrates. KOKUSAI CX-3000 also features an innovative wafer lift system which simplifies wafer loading with automated loading programs, as well as manual loading for flexibility. CX3000 is designed for maximum safety and performance, with overheat protection, exhaust auto-stop and safety valves, and full closed-loop thermal control. The furnace also has advanced temperature measurement and process control systems, ensuring safe and reproducible carburising results. CX-3000 is extremely quiet, with a noise level of less than 68 dB, and can reach temperatures up to 2,000° C. This makes it perfect for processing a variety of materials, from low-k dielectrics to poly-Si emitter materials. It is also suitable for operation in cleanroom environments, thanks to its low emissions and dust free deposition. In conclusion, KOKUSAI CX3000 is a powerful diffusion furnace and accessory, designed to provide the highest quality of performance, safety and reliability. It is suitable for a variety of applications ranging from power device materials to thin film deposition. The advanced thermal control systems and multi-level heating units make it ideal for uniform carburizing and annealing processes, with high speed and repeatability.