Used KOKUSAI DD-1223VN #9179435 for sale

KOKUSAI DD-1223VN is a diffusion furnace and accessories package used for semiconductor processing applications such as thin-film deposition, epitaxy, oxidation and diffusion. The furnace consists of a system controller, diffusion heater, turbo pump unit, and quartz chamber, with a focus on precision temperature control and accurate gas flow. The system controller is a 3-inch TFT LCD with touch panel interface that allows users to input temperature parameters, set PID loops for precise temperature control, view operating parameters, and more. The diffusion heater is a high-quality, high-efficiency heater that can reach temperatures up to 1500 degrees Celsius and has a uniform temperature distribution and is compatible with gases such as 1-tetra-methyl silane and silane. The turbo pump unit uses oil-free rotary pumps and can achieve a base pressure of 0.2Torr. This ensures reliable performance and pristine vacuum conditions. The quartz chamber is constructed of Fused Silica material designed to withstand high temperatures and corrosive materials. The chamber has an internal volume of 25l with a 12 inch diameter and an 8 inch height and features a pressure release valve to maintain the necessary pressure conditions during processing. DD-1223VN provides a comprehensive range of features that make it an ideal choice for any semiconductor processing application. With precise temperature control and reliable gas flow, it is an excellent option for deposition, epitaxy, oxidation, and diffusion. Additionally, the chamber's design ensures that materials won't contaminate the interior, which makes KOKUSAI DD-1223VN ideal for all processes.