Used KOKUSAI DD-802 #9181772 for sale

KOKUSAI DD-802 diffusion furnace is a versatile and dependable equipment for high-quality diffusion processing of metals and other substrates. It features a two-barrel design, with a main body and an attached working compartment, and is designed for a wide range of processes. The furnace has an integrated process control system that enables precise temperature control for uniform diffusion of the substrate. The temperature range is up to 1400°C, and the maximum inlet gas flow rate is up to 400 cubic centimeters per minute. DD-802 includes a full suite of diffusion accessories that can be configured to meet the specific requirements of each application. This includes the Sputter deposition tool, which allows for controlled deposition of a target material onto a substrate. The Oxidation Deposition Unit (ODS) provides uniform oxide growth and is ideal for volatile substances. The Advanced Gas Deposition Machine (AGDS) adds a layer of gas-phase deposition for a variety of substrates. The Multi-Particle Deposition Tool (MPDS) works together with the AGDS to deposit multiple layer combinations for uniform, highly controlled thin-film precursors. KOKUSAI DD-802 has an integrated electrical asset that offers protection to the substrate and prevents electrical mishaps. This is further enabled through the furnace itself, which provides high-level shielding radiation protection to ensure a safe operation environment. DD-802 features a multi-level security model that provides robust security for all components and processes. It has compatible software that allows users to track all processes and results, and also has a real-time temperature profile viewer to monitor process advancement. Finally, KOKUSAI DD-802 is designed to provide maximum convenience while operating in a variety of environments. It has an ergonomic design that minimizes fatigue from Standing for extended periods, and it also has an integrated cooling equipment for quick cool down periods. This ensures a consistent and efficient performance in any working environment.