Used KOKUSAI DD-803V #9057581 for sale

KOKUSAI DD-803V is a highly advanced diffusion furnace and accessories specifically designed for wafer doping and contact processing. It provides uniform heating up to 1150°C and has a wide range of capabilities that make it a highly desirable product. The furnace features a single-zone, low-pressure diffusion equipment with a hot zone of 20.5L size and a quartz-coated interior. It has an equipment temperature range of ~Ambient to 1150°C and a temperature uniformity of +/-10°C. Its even heating makes it suitable for various applications, such as wafer doping and contact processing. Furthermore, the furnace also comes with an additional CVD reactor that works efficiently with the diffusion based process. This is done to improve the thermal uniformity and accelerate the reaction rate. It also offers higher productivity and efficiency in handling the process. The reactor is lined with quartz for excellent thermal resistance and is easy to install and assemble. The furnace also features a wide range of accessories, which include a controller, an automatic wafer-loading system, and a conveyor and wafer-preheating unit. The controller has a real-time machine parameters display, which allows the user to take quick action if any parameter starts deviating and ensure wafers are processed accurately. The automatic wafer-loading tool is a built-in device, which handles raw wafers and keeps them neat and clean. The conveyor and wafer-preheating asset is designed to increase the efficiency and provide better control over the process. In conclusion, KOKUSAI DD-803-V is an advanced and reliable diffusion furnace. With its wide range of features, accurate heating up to 1150°C, and efficient accessories, it is suitable for a variety of applications. The additional components such as the CVD reactor, controller, and automatic wafer-loading systems make it a great choice in terms of price, performance, and reliability.