Used KOKUSAI DD-803V #9105647 for sale

KOKUSAI DD-803V
ID: 9105647
Vertical annealing furnace, 8" Currently crated.
KOKUSAI DD-803V is an advanced and reliable diffusion furnace and accessorie that utilizes advanced technological features to provide precise and repeatable results in temperature control, gas flow, and temperature uniformity. This furnace is ideal for diffusion processes such as when impurities are diffused into silicon substrates and other semiconductor materials. At the heart of KOKUSAI DD-803-V is its advanced heating system, which is comprised of 56 Micro controller PID modules and 16 regulated down-flow heater zones. The Micro controller PID modules regulate the temperature of each individual zone for precise temperature control to eliminate temperature gradients across the entire heater zone, providing precise and repeatable results. DD-803V is equipped with a high performance 4-port gas manifold that distributes process gases to the desired heater zones and is capable of controlling the direct and indirect flow of process gases precisely and repeatably. A gas mixer is also included, allowing for the precise flow of the gas mixture at any given moment of the process. Additionally, DD-803-V is equipped with a built-in quartz view window that allows users to monitor the process in real time. KOKUSAI DD-803V is programmable and can be controlled using either the built-in LCD touch panel or, optionally, through a computer with the supplied software. This allows users to conveniently monitor and control all aspects of the process and record the performance data for future reference. KOKUSAI DD-803-V also offers several safety features. This includes over temperature protection, which helps protect the operator in case of an emergency. Additionally, DD-803V has an automatic pressure relief valve for manual venting, an emergency stop button, and an outer shell of heat-resistant materials to protect the inner components from high temperatures. In short, DD-803-V is an advanced and reliable diffusion furnace and accessory that provides precise and repeatable results for a variety of diffusion processes. Its advanced heating system, 4-port gas manifold, gas mixer, LCD touch panel, and numerous safety features make it a reliable tool for the production of semiconductor materials.
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