Used KOKUSAI DD-823V #293729520 for sale

KOKUSAI DD-823V Diffusion Furnace is a high-performance, single-zone furnace specifically designed for reliable and efficient thermal-processing of semiconductor devices. This furnace features an independent chamber-environment monitoring system and user-friendly program operation that ensures consistent and repeatable results. It is designed to operate up to 1,400°C and contains a range of features that enable users to carry out reliable diffusion processing with the required precision and control. The furnace comprises of a furnace chamber, heated by a high-temperature air heater and insulated for energy efficiency and safety. It also contains a high-temperature mechanical pump and low-noise fan for cooling the chamber and driving the oxidization process. The proportional temperature controller allows for precise manipulation of the temperature through a PID closed loop system and achieves rapid heat-up and cool-down times with a high degree of stability and accuracy. The atmosphere within the process chamber is maintained and monitored by a gas-flow control system which consists of mass flow controllers for controlling the gas flow and a vacuum unit for the evacuation of the furnace chamber. A water-cooled turbo molecular pump is included to ensure that the pressure within the chamber remains within an acceptable range. All these specialized features ensure a uniform film deposition, even in the outlet side of the process chamber. Various accessories also come with DD-823V resulting in an overall value proposition. Some of these primary accessories include a Rotatable Shower Head Unit, which helps the formation of uniform layers in wafer level through the application of a shower of reactant gas, and a Linkage Plate, which enables automated loading and unloading of products without compromising the process chamber environment. In addition to these, a Quartz Top Load Unit is also included which is used to modify the atmosphere. Lastly, an activated carbon filter is included that effectively eliminates the organic impurities in the chamber atmosphere. Overall, KOKUSAI DD-823V Diffusion Furnace is a reliable and efficient diffusion processing solution that contains a range of specialized features and advanced accessories for the formation of uniform layers in wafer level. It ensures safe, efficient and repeatable thermal-processing of semiconductor devices at temperatures of up to 1,400°C and offers a high degree of precision and control over the process. An array of useful accessories are included to further improve the effectiveness of the furnace and help it provide a value proposition.