Used KOKUSAI DD-853 #9131345 for sale

KOKUSAI DD-853 is a high performance diffusion furnace specifically designed to meet the requirements of silicon and compound semiconductor fabrication and development. It is capable of performing Sequential Anneal Process (SAP) for low temperature drive-in & low temperature polysilicon deposition. The furnace consists of a high temperature hearth chamber, designed to be loaded with up to 6076 sample sticks, with adjustable positioning. Temperatures can be adjusted from 25 degrees Celsius (T-Slope control) to 1000 degrees Celsius and can be maintained for long periods of time without any issues. The furnace also features a low-density carbon-controlled cooling equipment, which ensures accurate temperature control and uniform cooling of the samples during the diffusion process. DD-853 has automated control systems for oxygen and nitrogen atmospheres, as well as other gases, such as argon, hydrogen, and methane. It is equipped with a 3-step pressure/temperature auto-control system for precise sample diffusion. Additionally, the unit has two cooling ports and a locking port to ensure proper sample loading and unloading. The accessorie that comes with KOKUSAI DD-853 includes a driver for loading samples onto the diffusion sticks, a timer for precise monitoring of the process, and a vacuum cleaner/purifier to prevent furnaces from getting faster wear-out. DD-853 also has a built-in safety alarm machine to protect users in case of any abnormal operation. It comes with a full range of sensors and indicators, including a monitor and an alarm button. The internal systems are designed to monitor the temperature, pressure and gas composition to ensure optimal processes. KOKUSAI DD-853 is one of the most advanced diffusion furnaces on the market and is the perfect solution for any production and research needs. With its long-term stability and safety features, as well as the various accessorie that come with the package, DD-853 is an ideal choice for semiconductor production and development.